摘要
一种具有高选择渗透性的新型硅膜由硅树脂膜裂解制成。膜对Ｈ２，Ｏ２，Ｎ２等气体的渗透系数的１０＾２－１０＾３Ｂａｒｒｅｒ，Ｈ２／Ｎ２和ＯＮ２分离因子分别为１１－１３和３－４。这种硅基膜适合于代于３００℃的含氧环境下工业气体的分离。
A new silicon-based membrane with high permeability was made by pyrolyzing a silicon resin membrane. Its permeability coefficients for H2, O2, N2 are about 102-103 Barter, separation factors for H2/N2 and O2/N2 are 11-13 and 3-4 respectively. This silicon membrane is suitable for industrial gas separation in an oxidizing environment at the temperature of below 300℃.
出处
《北京工业大学学报》
CAS
CSCD
1997年第3期99-104,共6页
Journal of Beijing University of Technology
基金
北京市自然科学基金资助项目
关键词
气体分离膜
硅膜
渗透系数
裂解
膜分离设备
membrane for gas separation, silicon based membrane, permeability coefficient, separation factor, pyrolysis
