摘要
描述了一种新的亚波长光栅的微细加工技术,即X光光刻得到相应的亚微米级的线宽图形,再利用显影技术获得了高深宽比的立体亚波长光栅.用此纳米加工技术获得了栅距为500 nm、250 nm、150 nm,光栅高度为1900nm的特殊纳米光栅模具,开发了纳米无反射结构,并研制成功了亚波长光栅.该亚微米线宽微细加工技术可用于布拉格光栅、DVD读写头、无反射表面等需要亚微米结构的器件中.
A new micro fabrication method for sub-wavelength gratings was presented, that is, sub-wavelength line and space pattern were obtained with X-ray lithography and then bulk gratings with high aspect ratio were formed with development. The grating molds with line widths of 500 ran, 250 nm and 150 nm, and the height of 1 900 nm could be obtained by this method. And nano anti-reflection surfaces and sub-wavelength gratings were also developed. This proposed microfabrication method can be applied in the devices such as Bragg gratings, DVD pickup and anti-reflection surfaces.
出处
《纳米技术与精密工程》
EI
CAS
CSCD
2007年第4期249-252,共4页
Nanotechnology and Precision Engineering
基金
国家自然科学基金资助项目(6037701460777016)
关键词
亚波长光栅
X光光刻
高深宽比
sub-wavelength gratings
X-ray lithography
high aspect ratio
