摘要
胶层特性是影响磁光盘性能的重要因素，通过实验研究了甩胶工艺对胶层特性的影响，通过调整滴胶量、甩胶时间和电机转速来控制胶层的厚度，提高胶层的均匀性。
The lacquer layer characteristic is a important factor influencing quality of magneto-optic disks.In this experiments,we have studied the influence of lacquering technics on lacquer layer characteristic.Lacquer's amount、lacquering time and motor speed were optimized to control lacquer layer thickness and improve lacquer layer uniformity.
出处
《电子工艺技术》
1997年第4期152-153,156,共3页
Electronics Process Technology
关键词
甩胶工艺
厚度均匀性
磁光盘
Lacquering technics Thickness Thichness uniformity
