摘要
采用电子束辐照方法成功制备了微孔阵列聚丙烯(PP)膜,将微孔阵列掩膜覆盖在聚丙烯膜上,在电子束下进行辐照,然后将样品在蚀刻剂中进行蚀刻,即可得到微孔阵列聚丙烯膜,其孔径为200μm。在研究中采用XRD、GPC、DSC等仪器分别测定了不同剂量辐照的PP样品的结晶度和分子量,分析了它们可能存在的内在联系及其对蚀刻工艺的影响,并对不同方法测得的结晶度结果进行了对比;探讨了蚀刻时间、蚀刻温度、蚀刻剂浓度等因素对蚀刻结果的影响;使用电子拉力机测定了不同电子束辐照剂量PP膜的力学性能;采用电子显微镜对制备的微孔阵列聚丙烯膜图案和孔径进行了相关表征。
In this paper, micro-porous array on polypropylene membranes were successfully prepared by electron-beam irradiation, before which the membrane were covered with mask and then etched with oxidation solution after which. The aperture of the prepared membranes was about 200 μm. GPC DSC XRD was used to measure the molecular weight, to characterize the thermal properties and the crystallinity of the irradiated crystal polymer respectively. The effect of etching time, temperature and the concentration of solvent on the etching rate also was investigated. The mechanical properties of irradiated and etched membranes at different irradiation doses were determined by use of electronic tensile testing machine and the pattern morphology as well as aperture of the prepared micro-porous array membranes were characterized by electron microscope.
出处
《辐射研究与辐射工艺学报》
CAS
CSCD
北大核心
2007年第6期330-335,共6页
Journal of Radiation Research and Radiation Processing
基金
上海市科委纳米专项基金(05nm05046)资助
关键词
电子束辐照
聚丙烯膜
蚀刻
微孔阵列
Electron-beam irradiation, Polypropylene （PP）, Etching, Micro-porous array
