摘要
介绍了光刻机底面对准系统的基本原理,并分析了传统底面对准系统存在的缺点,给出了基于USB2.0与CPLD的光刻机底面对准新系统的设计方案。论述了系统硬件和软件的实现,并对其中的关键模块进行了深入分析。与传统底面对准系统相比,该对准系统成本降低约70%,同时,系统的可靠性大幅提高。实验表明,该系统的底面对准精度达到0.25μm,满足系统设计要求。
The fundamental principle of lithography equipment bottom side alignment （BSA） system was introduced. An analysis of traditional BSA system disadvantages was made, followed by the design of new BSA system based of USB2.0 and CPLD presented. The realization of the system software and hardware was presented, with an in-depth analysis of the key modules of the system. Compared with the traditional BSA system, the cost of the new system reduces by 70%, and the reliability improves greatly. The experimental results show that the BSA precision of the system achieves 0.25 μm, satisfying the practical requirement.
出处
《微纳电子技术》
CAS
2007年第12期1082-1086,共5页
Micronanoelectronic Technology
关键词
光刻机
底面对准
USB2.0
复杂可编程逻辑器件
lithograph equipment
bottom side alignment
USB2.0
complex programable logic device CPLD
