摘要
本文采用电子束蒸发配以Kaufman离子源产生的氧离子辅助沉积了Ta2O5薄膜,用原子力显微镜(AFM)表征了薄膜的表面形貌、表面粗糙度,探讨了Ta2O5薄膜在此工艺下的表面质量。用分光光度计测试了不同厚度下薄膜的透射率,计算出了其折射率。实验及分析结果表明:所制备的Ta2O5薄膜表面平整度高,是弱吸收薄膜,随薄膜厚度的增加短波截止波长向长波方向略有漂移;折射率随膜厚的变化不大,此制备工艺的可重复性强,制备薄膜性能稳定;薄膜表面粗糙度随膜厚的增加而增加,但是增加不大,所制备Ta2O5薄膜是理想光学薄膜;离子束的加入,使得薄膜表明形貌变化更加复杂,打破了热蒸发制备薄膜的柱状生长模式。
The Ta2O5 thin films were prepared by O^＋ Assisted Electron Beam Evaporation in which the O^＋ ion beam were produced from Kaufman Ion Source, The surface morphology and roughness of the thin films were measured by atomic force microscope （AFM）, with the transmittance tested by spectral photometer to calculate the refractive index, Experiment and analysis results showed that the thin film surface is highly smooth and flat but weak in absorbability. The cut-off wavelength of short-wave drifts slightly to long-wave along with the increasing film thickness, but the refractive index is relatively stable to the change in film thickness. This preparation process is highly reproducible with stable film properties provided. Surface roughness of the thin films increases slightly with increasing thickness. So, the films prepared are regarded as ideal optical ones. The ion beam causes the film surface morphology to change diversely, thus breaking through the columnar growth mode which the thermal evaporation process bound to form.
出处
《真空》
CAS
北大核心
2007年第5期32-35,共4页
Vacuum
