摘要
提出一种制作连续沟形微光学元件的新方法。用移动物面上二元图案的方法来获得连续灰度的记录，再用卤化银明胶处理技术，把灰度银像转化成明胶硬度潜像，最后采用酶蚀显影工艺把潜像显现为连续沟形的浮雕结构。文中给出了原理分析和实验验证。
A new technique for fabricating continuous relief micro optics elements (MOEs) has been developed. At first, the binary pattern on the object plane is transformed into continuous grey image on the recording plate by using the exposure system with movable object plane. And then the silve image is in term transformed into harden laten image by using silve halide gelatin processing procedure. Finally, this laten image is developed by enzyme treating. The principle analysis and experimental demonstration are described as well in this paper.
出处
《光学学报》
EI
CAS
CSCD
北大核心
1997年第2期237-242,共6页
Acta Optica Sinica
基金
国家自然科学基金
浙江省教委科研基金
关键词
微光学元件
光刻术
卤化银明胶
光学元件
MOE, photolithography, silve halide sesitived gelatin, protein digesting enzyme.
