摘要
介绍了一种使用螺旋式线型工具电极的电化学机械抛光新工艺。通过试验分析了加工过程中电化学机械复合作用机理及主要工艺参数对加工件表面质量的影响,实现了将较高的表面粗糙度值降至Ra0.25μm以下的加工效果。
A new electrochemical mechanical polishing （ECMP） procedure was presented. Based on the mechanism of ECMP, a compound polishing process which was produced by a new spiral electrode was studied. Major parameters of the process were also analyzed in experiments. The roughness of the workpieee was reduced from a relatively high value to a low one （less than Ra0. 25μm）.
出处
《电加工与模具》
2007年第3期55-58,共4页
Electromachining & Mould
基金
国家自然科学基金资助项目(50575046)
