摘要
本文综述了80年代酸分解高分子的进展,并对其作了详细分类。以其不同的结构特征阐明了它们的酸解机理。本文还对酸解高分子用于成像材料、特别是化学增幅抗蚀剂的前景作了展望。
This paper presents a review on a lot of asidolysis polymers in the 1980′ s. A detailed classification of the polymers are given. The charac-teristics of their structures are illustrated from the view point of chemistry and on these grounds their acidolysis mechanism are explained. The pros-pects of using them for the imaging materials, especially chemical amplifica-tion resists, are also forecasted.
出处
《高分子通报》
CAS
CSCD
1990年第4期205-212,共8页
Polymer Bulletin
关键词
酸分解高分子
化学增幅
抗蚀剂
Acidolysis polymer, Chemical amplification resist, Acidolysis mechaniam, Photoresist
