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Surface Modification of Fluororubber Using Atmospheric Pressure Dielectric Barrier Discharge(DBD) 被引量:1

Surface Modification of Fluororubber Using Atmospheric Pressure Dielectric Barrier Discharge(DBD)
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摘要 Fluoride rubber F2311 film, an alternating copolymer of CF2-CFC1 (CTFE) and CH2-CF2 (VF2) components, was treated by atmospheric pressure dielectric barrier discharge (DBD) in air. The surface structure, topography and surface chemistry of the treated F2311 films were characterized by contact angle measurement, atomic force microscopy (AFM), and X-ray photoelectron spectroscopy (XPS), respectively. The experimental results showed that a short time air plasma treatment led to morphological, wettability and chemical changes in the F2311 films. The surface hydrophilicity increased greatly after the plasma treatment, the static water contact angle decreased from 98.6° to 32°, and oxygen containing groups (C=O, O-C=O, etc. ) were introduced. Atomic force microscopy revealed that plasma produced by DBD etched F2311 films obviously. The roughness of the samples increased remarkably with the formation of peaks and valleys on the treated surfaces. The increased surface wettability may be correlated with both the introduction of hydrophilic groups due to air plasma oxidation of the surface and the change in surface morphology etched by DBD. Fluoride rubber F2311 film, an alternating copolymer of CF2-CFC1 (CTFE) and CH2-CF2 (VF2) components, was treated by atmospheric pressure dielectric barrier discharge (DBD) in air. The surface structure, topography and surface chemistry of the treated F2311 films were characterized by contact angle measurement, atomic force microscopy (AFM), and X-ray photoelectron spectroscopy (XPS), respectively. The experimental results showed that a short time air plasma treatment led to morphological, wettability and chemical changes in the F2311 films. The surface hydrophilicity increased greatly after the plasma treatment, the static water contact angle decreased from 98.6° to 32°, and oxygen containing groups (C=O, O-C=O, etc. ) were introduced. Atomic force microscopy revealed that plasma produced by DBD etched F2311 films obviously. The roughness of the samples increased remarkably with the formation of peaks and valleys on the treated surfaces. The increased surface wettability may be correlated with both the introduction of hydrophilic groups due to air plasma oxidation of the surface and the change in surface morphology etched by DBD.
出处 《Plasma Science and Technology》 SCIE EI CAS CSCD 2007年第3期296-300,共5页 等离子体科学和技术(英文版)
基金 the Joint Foundation of the Council of National Natural Science Foundation of China(NSFC) China Academy of Engineering Physics(CAEP) the National Natural Science Foundation of China(NSAF United Foundation)
关键词 fluororubber dielectric barrier discharge (DBD) surface modification contact angle atomic force microscopy (AFM) X-ray photoelectron spectroscopy (XPS) fluororubber, dielectric barrier discharge (DBD), surface modification, contact angle, atomic force microscopy (AFM), X-ray photoelectron spectroscopy (XPS)
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