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基于氧化铝模板直接电沉积法镍纳米线的制备与表征 被引量:11

Preparation and characterization of nickel nanowires by direct electrodeposition in anodic alumina membrane
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摘要 在未氧化铝和氧化铝之间经过降压剪薄阻挡层直接进行电沉积,采用不同电压进行电沉积制备了镍纳米线,并采用SEM,TEM和X射线衍射对所制备的镍纳米线进行了表征,研究了电沉积电压对纳米线结构的影响。结果表明:镍纳米线的外形决定于氧化铝模板的形貌,其直径和最大长度分别依赖于模板孔洞的直径和长度,当电沉积电压为1,1.5和2V时制备的镍纳米线为多晶结构,随着电沉积电压的升高,镍纳米线为沿[220]择优取向的单晶结构(电沉积电压分别为3V和4V),当电沉积电压进一步升高时,择优取向由[220]转为[111]方向(电沉积电压5V)。 The nickel nanowires were prepared directly by electrodeposition in anodic alumina membrane (AAM) after modification of AAM. The structure and topography of nanowires were characterized by SEM, TEM and XRD. The effect of deposition voltage on texture of nickel nanowires was studied. The results show that the morphologies of nickel nanowires depend on anodic alumina membrane. The diameter and length of nanowires are separately affected by pore diameter of AAM and deposition time. The nickel nanowires are poly-crystalline when the deposition voltages are low, such as 1 V, 1.5 V and 2 V. The nickel nanowires change to single crystal with a preferred orientation along [220] when the depositon voltages become larger, such as 3 V and 4 V. The preferred orientation transforms from [220] to [111] with further increase of deposition voltage (5 V).
出处 《中国有色金属学报》 EI CAS CSCD 北大核心 2007年第5期727-731,共5页 The Chinese Journal of Nonferrous Metals
关键词 镍纳米线 氧化铝模板 电沉积 晶体结构 nickel nanowires anodic alumina membrane electrodeposition crystalline structure
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