摘要
介绍一种高温氧化薄膜应力的测定技术,它能在一定高温氧化条件下原位测定氧化膜中的生长应力,在某一温度变化范围内原位测定氧化膜中的热应力.
A measuring technique of high temperature oxide thin film stress is introduced. The growth stresses of the oxide thin film can be measured on the condition of the constant high temperature oxidation and the thermal stresses can be measured within the variations of a certain temperature. The measuring technique can be carried out with an ordinary diffractometer.
出处
《上海交通大学学报》
EI
CAS
CSCD
北大核心
1997年第1期80-82,共3页
Journal of Shanghai Jiaotong University
基金
国家自然科学基金
华东分析测试中心测试基金