期刊文献+

紫外纳米压印模板表面修饰工艺研究

Research the Process of Template Embellishment Based on UV-NIL
下载PDF
导出
摘要 研究紫外纳米压印技术的模板表面修饰工艺,对经过表面修饰的模板与未经修饰的模板得到的不同压印结果,通过大量实验进行对比分析,验证模板表面修饰工艺是有效控制压印结果,确保压印复型精度的关键。 It has the advantages of sub-10nm resolution,low cost and high-throughput. This paper presents the process of template embellishment based on UV-NIL. Compared with the embellished and unembellished template,the process of template embellishment based on UV-NIL is useful in controlling the result of nanoimprint and ensuring the precision of duplication.
出处 《机电一体化》 2007年第2期39-42,共4页 Mechatronics
基金 上海市纳米科技与产业发展促进中心资助项目(0552nm052)
关键词 紫外纳米压印技术 模板表面修饰工艺 抗粘连层 集成电路 UV-NIL process of template embellishment anti-sticking layer
  • 相关文献

参考文献6

  • 1S.Y.Chou,P.R.Krauss,P.J.Renstrom.Imprint of Sub-25 nm Vias and Trenches in Polymers[J].Applied Physics Letters,1995,67(21):3114-3116. 被引量:1
  • 2S.Y.Chou,P.R.Krauss,W.Zhang,et al.Sub-10 nm Imprint Lithography and Applications[J].J.of Vac.Sci.Technol.1997(B15):2897-2904. 被引量:1
  • 3International Technology Roadmap for Semiconductors.2003:Semiconductor Industry Association. 被引量:1
  • 4刘彦伯,顾长庚,乌建中,朱兆颖.下一代实用光刻技术——纳米压印技术[J].机电一体化,2005,11(6):14-19. 被引量:9
  • 5W.A.Zisman.Adhension and Cohension[M].New York:Elsevier,1962:183. 被引量:1
  • 6T.Nishino,M.Meguro,K.Nakamae,et al.The Lowest Surface Free energy Based on CF3 Alighment[J].Langmuir,1999 (15):3421-4323. 被引量:1

二级参考文献8

  • 1Chou S Y, Kelmel C. Ultrafast and Direct imprint of Nanostructures in Silicon. Nature,2002,417 (20) :835 ~ 838. 被引量:1
  • 2Jake way S C, Crabtree H J, Veres T, et al. Transition of MEMS technology to nanofabrication [ C ]. ICMENS 2003, Banff,Alberta, Canada,2003:118 ~ 122. 被引量:1
  • 3Watanabe K, Morita T, Kometani R. Nanoimprint using three dimensional microlens mold made by focused - ion beam chemical vapor deposition [ J ]. Journal of vacuum science & technology B:Microelectronics and nanometer structures, 2004,22 ( 1 ): 22 ~ 26. 被引量:1
  • 4Resnick D J, Mancini D, Dauksher W J, et al. Improved step and flash imprint lithography templates for nanofabrication [ J ]Microelectronic engineering,2003,69 ( 2 ~ 4 ) :412 ~ 419. 被引量:1
  • 5Lebib A, Chen Y, Cambril E, et al. Room -temperature and low - pressure nanoimprint lithography [ J ]. Microelectronic engineering,2002,61 ~ 62:371 ~ 377. 被引量:1
  • 6Vratzov B, Fuchs A, Lemme M, et al. Large scale ultraviolet based nanoimprint lithography [ J ]. Journal of vacuum science & technology B: microelectronics and nanometer structures ,2003,21(6) :2760 ~2764. 被引量:1
  • 7Schulz H, Wissen M, Scheer H C. Local mass transport and its effect on global pattern replication during hot embossing [ J ].Microelectronic engineering, 2003, 67:657 ~ 663. 被引量:1
  • 8Zhang W, Chou S Y. Fabrication of 60 - nm transistors on - in.wafer using nanoimprint at all lithography levels [ J ]. Applied physics letters ,2003,83 (8) :1 632 ~1 634. 被引量:1

共引文献8

相关作者

内容加载中请稍等...

相关机构

内容加载中请稍等...

相关主题

内容加载中请稍等...

浏览历史

内容加载中请稍等...
;
使用帮助 返回顶部