期刊文献+

电子束刻蚀分步啁啾相位掩模板的优化 被引量:2

Optimization of Electron-beam-written Step-chirped Phase Masks to Improve Quality of the Chirped FBG
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摘要 掩模板制造过程中采用的是分步啁啾方法,分步间长度容易出现误差,这种接缝误差是引起啁啾光纤光栅(CFBG)时延纹波的系统误差。理论分析了相位掩模板的接缝误差对CFBG时延纹波的影响。分析表明,对长度为140mm的掩模板采用1.4mm的步长,接缝误差影响最小。并进行了实验验证。 The chirped electron-beam written phase mask is fabricated by step-chirped method. The step-chirped phase mask is a useful and powerful device to realize a nonlinearly or linearly stepwise chirped fiber grating with broad bandwidth. But the stitching errors of electron-beam written phase masks always occur between neighboring sections. The stitching errors can arouse the time delay ripple of chirped fiber Bragg gratings(CFBGs).The 140 mm CFBGs,which are written by using 2.0 mm,1.4 mm,1.0 mm and 0.5 mm stepwise chirped phase mask, have been studied by simulation and experiment. The best is the 1.4 mm step-chirped mask. The simulation agrees with the experiment well.
出处 《光电子.激光》 EI CAS CSCD 北大核心 2006年第12期1409-1412,共4页 Journal of Optoelectronics·Laser
基金 国家"863"计划资助项目(2004AA31G200) 国家自然科学基金资助项目(60477017) 北京市自然科学基金资助项目(4052023) 霍英东基金资助项目(91062) 教育部新世纪优秀人才支持计划资助项目
关键词 光纤通信 啁啾光纤光栅(CFBG) 相位掩模板 分步啁啾 接缝误差 时延纹波 optica fiber communication chirped fiber Bragg grating(OFBG) phase mask stitching error time delay ripple
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参考文献7

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