摘要
本文利用计算机对多层介质高反膜反射谱的模拟发现,当构成高反膜系的高、低两种折射率材料的光学厚度不一致时,反射带两侧的第一个谷值的大小将不同,据此作者认为在高反膜镀制时可根据反射带两侧第一个谷值大小情况来调节高反膜中单层膜厚度,实验结果证明了模拟结果的正确性,同时也确证了作者提出的这种方法是可行的。
A novel method of adjusting the thickness of the single layer of high and low index materials was put forward according to the computer simulation, which show that the values of the valleys nearest to the reflection band were different when the optical thicknesses of the high and low index materials were different. The experiment results verified the validity of the simulation and confirmed the feasibility of the method.
出处
《光电工程》
EI
CAS
CSCD
北大核心
2006年第11期142-144,共3页
Opto-Electronic Engineering
基金
国家973基金资助项目(G200068302)
北京市教委基金资助项目(KM200310005009)
关键词
高反膜
四分之一波长
光学厚度
物理厚度
High-reflection films
One quarter wavelength
Optical thickness
Physical thickness