摘要
展示真实的工艺结论,介绍在基片本身或监控片上进行光学直接监控的方法应用于大面积(最大基片盘直径1400 mm)镀膜的成功经验。直接监控技术可以最快速的再现高难度的设计要求,保证大面积,高精度镀膜设备上的高成品率。文中列举的各类多层膜的实验结果清楚地证明了这种强大的监控手段的应用潜力。可使用直接监控方式镀膜的膜系包括截至滤光片,偏振膜,分光膜以及多腔带通滤光片。所有这些膜系都是在PIAD(等离子辅助沉积)和PARMS(等离子体辅助反应磁控溅射)的方式下完成的。实验的重复性和均匀性体现了直接监控的优势。在塑料基底上应用等离子体辅助工艺的关键在于调整离子源或等离子源本身。他们改变热度和等离子轰击的能力通常是工艺的关键因素,从而使工艺更适合于象塑料这样对温度和等离子轰击敏感的基材。
Substantial progress has been achieved for coating systems with large area substrate holders （up to Ф1400 mm） by intermittent optical monitoring on a substrate or a witness. This technique enables rapid prototyping with tight specifications and high yields in large area or high precision deposition plants. Application results of challenging optical multilayer systems are demonstrating clearly the potential of this powerful monitoring technique. The monitoring capability was investigated for a lot of different layer systems such as sophisticated edge filters, polarizer coatings, beam splitters and multiple cavity band-pass filters. Strong coincidence of theory with experiment was achieved with plasma ion assisted deposition （PIAD） and plasma assisted reactive magnetron sputtering （PARMS）. Reproducibility experiments have clearly shown the benefits of this monitoring technique.
In adapting plasma assisted deposition processes to plastic substrates, a key role is played by the ion or plasma sources applied. Their capabilities of changing the heat and plasma impact are often the crucial factor, which allows an adaptation of a process for application on a temperature and plasma sensitive substrates, such as plastic.
出处
《光学仪器》
2006年第4期88-94,共7页
Optical Instruments
