摘要
Modification of KL zeolite by chemical vapour deposition (CVD) of Si(OEt)4 and (CH3)3SiOSi(CH3)3 was used to study the influence of zeoltie support on the aromatization of n-hexane over Pt/KL catalyst. The pore size and pore volume of zeolite were decreased by CVD. The acidic hydroxyl groups remaining on the surface of KL zeolite were removed and thus the selectivity of non-acidic catalyzed aromatization reaction was improved. Whereas the activity of aromatiztion reaction was decreased due to the destruction of some of active sites in KL zeolite for 1,6-cyclization. Becuase of the coverage of the framework of zeolite by CVD of SiO2, Pt particles became more electron-excess.Therefore, the silica-coated catalysts were easier to be poisoned by sulphur.
Modification of KL zeolite by chemical vapour deposition (CVD) of Si(OEt)4 and (CH3)3SiOSi(CH3)3 was used to study the influence of zeoltie support on the aromatization of n-hexane over Pt/KL catalyst. The pore size and pore volume of zeolite were decreased by CVD. The acidic hydroxyl groups remaining on the surface of KL zeolite were removed and thus the selectivity of non-acidic catalyzed aromatization reaction was improved. Whereas the activity of aromatiztion reaction was decreased due to the destruction of some of active sites in KL zeolite for 1,6-cyclization. Becuase of the coverage of the framework of zeolite by CVD of SiO2, Pt particles became more electron-excess.Therefore, the silica-coated catalysts were easier to be poisoned by sulphur.
出处
《物理化学学报》
SCIE
CAS
CSCD
北大核心
1996年第10期939-942,共4页
Acta Physico-Chimica Sinica
关键词
化学气相沉积
沸石
催化剂
正己烷
芳构化
铂
Chemical vapour deposition, KL, zeolite, Pt supported, Armoatization of n-hexane, Sulphur poisoning
