摘要
简述了极坐标激光直写技术原理,并利用该技术研究了在铬板、光刻胶版表面制作微结构的工艺,制作了光栅、非涅耳透镜、曲面衍射透镜、平面连续微结构衍射透镜掩模以及基于MEMS技术的微型太阳敏感器光学掩模。
Theory of the circular laser writing technology was described, and the technology for fabrication of microstructure on the chrome and photoresist mask was studied. Grating, spherical surface diffractive lens and mask of plane diffractive lens with continuous relief structure were fabricated using the technology. The optical mask of the micro sun sensor based on the MEMS technology was also fabricated.
出处
《激光与红外》
CAS
CSCD
北大核心
2006年第7期525-528,共4页
Laser & Infrared
关键词
激光直写技术
掩模
微结构
微光学
laser writing technology
mask
micro-structure
micro optics
