摘要
本法先用ＥＤＴＡ螯合Ｃｕ２＋和其他金属阳离子，然后加入ＤＬ－半胱氨酸作为释放剂分解Ｃｕ－ＥＤＴＡ，释放出的ＥＤＴＡ用Ｐｂ２＋标准溶液返滴定，以ＸＯ－ＭＴＢ－ＣＰＢ为混合指示剂，滴定终点颜色变化敏锐，测定结果准确。并对多种金属离子的干扰进行了研究。
The determination process is based on initial chelation of Cu2+ and other metal ions with EDTA and subsequent decomposition of Cu-EDTA with DL-cysteine as liberate agent. The liberated EDTA is titrated with Pb2+ standard solution using XO-MTB-CPB as alexed indicator. Titration end point is sensitive and determination result is accurate. Interference of various metal ions is also studied.
出处
《电镀与涂饰》
CAS
CSCD
1996年第3期9-12,共4页
Electroplating & Finishing
基金
甘肃省自然科学基金
关键词
化学分析
螯合滴定
铜
电镀
镀液
镀层
chemical analysis, selective, chelatometry, copper
