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氧化硅材料光活性缺陷中心研究进展

Progress in studies on the optically active defect center in silica
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摘要 氧化硅材料在光通信、半导体光电子器件及照明等领域具有广泛应用,对其光学性能研究进行总结、归纳具有重要意义。氧化硅材料本征E’、2种缺氧型以及各种富氧型光活性缺陷中心在光导纤维及紫外吸收等应用中扮演了很重要的作用,某些具有良好发光性能的缺氧中心及掺杂离子或半导体纳米粒子发光中心的深入研究使氧化硅材料在照明领域具有良好的应用前景。对氧化硅材料各类光活性缺陷中心阴离子配位场的修饰将对这些光活性缺陷中心的光学性能产生显著的影响,并有可能进一步提高其发光性能。 The recent progress in researches on the optical properties of silica widely used in optical communication, semiconductor photoelectron apparatus and lighting field is reviewed. The optically active defect centers of such types as E', two kinds of oxygen-deficiency and some kinds of oxygenrichness in silica play an important role in optical communication fiber and UV absorption. The researches on some oxygen-deficient defects and the metal ions doped or implanted semiconductor nanoparticles with fine luminescence properties have made it possible for silica to be used in the lighting field. The negative ions modified anion coordination field may remarkably affect and improve the optical properties of the optically active defects in silica.
出处 《合肥工业大学学报(自然科学版)》 CAS CSCD 北大核心 2006年第6期641-645,共5页 Journal of Hefei University of Technology:Natural Science
关键词 光学性能 氧化硅 光活性 缺陷中心 optical property silicon dioxide optical activity defect center
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  • 1李新军,李芳柏,古国榜,王良焱,徐悦华,黄琮.磁性纳米光催化剂的制备及其光催化性能[J].中国有色金属学报,2001,11(6):971-976. 被引量:21
  • 2徐春祥,娄志东,徐叙.薄膜电致发光器件中SiO_2加速作用的直接证据[J].发光学报,1995,16(3):187-191. 被引量:5
  • 3Skuja L.Optically active oxygen-deficiency-related centers in amorphous silicon dioxide[J].Journal of Non-Crystalline Solids,1998,239(1):16-48. 被引量:1
  • 4Skuja L.The origin of the intrinsic 1.9 eV luminescence band in glassy SiO2[J].Journal of Non-Crystalline Solids,1994,179:51-69. 被引量:1
  • 5Yuryo S.Oxygen-related red photoluminescence bands in silica glasses[J].Journal of Non-Crystalline Solids,2003,316(3):389-392. 被引量:1
  • 6Depairs O,Griscom D L,Megret P,et al.Influence of the cladding thickness on the evolution of the NBOHC band in optical fibers exposed to gamma radiations[J].Journal of Non-Crystalline Solids,1997,216:124-128. 被引量:1
  • 7Hosono H,Kajihara K,Suzuki T,et al.Vaccum ultraviolet optical absorption band of non-bridging oxygen hole centers in SiO2 glass[J].Solid State Communications,2002,122:117-120. 被引量:1
  • 8Skujia L,Mizuguchi M,Hosono H,et al.The nature of the 4.8 eV optical absorption band induced by vacuum-ultraviolet irradiation of glassy SiO2[J].Nuclear Instruments and Methods in Physics Research B,2000,166:711-715. 被引量:1
  • 9Griscom D L,Mizuguchi M.Determination of the visible range optical absorption spectrum of peroxy radicals in gamma-irradiated fused silica[J].Journal of Non-Crystalline Solids,1998,239:66-77. 被引量:1
  • 10Silin A R,Skujia L N.Intrinsic defects in fused silica[J].Journal of Non-Crystalline Solids,1984,71:443-445. 被引量:1

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