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电沉积法制备碲靶 被引量:1

PREPARATION OF TELLURIUM TARGET BY ELECTRO-DEPOSITION METHOD
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摘要 采用电沉积法将Te电沉积在以Ni为底衬的Cu靶托上,制备出了质子回旋加速器CYCLONE-30用碲靶,用以生产放射性医用同位素123I。研究了电流密度、电沉积时间、温度、电沉积溶液中碲的质量浓度(以TeO2计)、碱度等工艺条件对碲靶质量的影响。推荐最佳工艺条件为:电沉积液介质浓度c(KOH)=1mol/l;ρ(TeO2=55-65mg/ml;电流密度J=10-12MA/cm2;温度T=18-30℃;电沉积时间t约为1h。在此工艺条件下制备的碲靶的质量厚度为14-20mg/cm2,沉积层质地致密、均匀、无斑点,附着力强。 The tellurium target used for producting medical radioisotope 123I in Cyclontron-30 is prepared by electro-deposition method. The main technological conditions of electro-deposition such as concentraction of medium c (KOH), mass concentration of tellurium ρ (TeO2), current density J, time t and temperature T of electro - deposition, ect, are researched experimentally. The suggested technological conditions are as follows: c (KOH) = 1 mol/l, ρ(TeO2) = 55-65 mg/ml, J = 10- 12 mA/cm2, t≈1 h and T = 18 - 30℃. The mass thickeness of prepared Te target is in the range of 14 - 20 mg/cm2, the deposited foil is firm, and the deposited grain is uniformly distributed without maculae.
出处 《原子能科学技术》 EI CAS CSCD 北大核心 1996年第3期249-252,共4页 Atomic Energy Science and Technology
关键词 碲靶制备 电沉积法 工艺条件 回旋加速器 Preparation of tellurium target Electro-deposition methed Technological condition
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