摘要
采用脉冲多弧离子镀技术制备TiN/AlN纳米多层膜,对该薄膜的结构研究表明,随着调制周期的减小,稳定态六方AlN相逐渐转变成亚稳态立方AlN相,形成以TiN/AlN超晶格结构为主的薄膜。并从与标准图谱的对比中可知,TiN/AlN超晶格是AlN在立方TiN簿膜的影响下,在TiN层上以亚稳态相立方结构外延生长所形成。另研究显示,TiN/AlN薄膜具有一定的超硬效应以及在硬质合金刀具上优良的使用性能。
The TiN/AlN multilayers was prepared using impulse multi-arc ion plating technique. Film structure study shows that steady Wurtzite-AlN phase changing to unsteady NaCl-type crystal structure gradually with reducing film period. The main phase structure of this multilayer is TiN/AlN supperlattice. It can be concluded from the standard pattern comparison that TiN/AlN supperlattice was formed when NaCl-type AlN epitaxial-growth on TiN film surface and influenced by this prototype material. And TiN/AlN multilayer shows high hardness and excellent application property on hard alloy substrate.
出处
《热加工工艺》
CSCD
北大核心
2005年第11期23-25,共3页
Hot Working Technology
基金
湖北省教育厅基金资助项目(2002A01008)
