摘要
从理论和实验出发,分析脉冲电弧源的放电机理,讨论了脉冲电弧源发散特性,得到影响膜厚空间分布的主要因素,建立膜厚空间分布和主要因素之间的数学模型,结果表明和实验数据吻合。
Discusses theoretically and experimentaly the discharge mechanicsm and diverging feature of pulsed arc source, thus obtaining the main influencing factors on the films' thickness. Then, a mathematical model is developed between the main influencing factors and films' thickness. The solution to the model shows its conformity with experimental results.
出处
《真空》
CAS
北大核心
2005年第6期33-35,共3页
Vacuum
基金
陕西省教育厅专项科研计划项目资助(项目编号:02JK14)
关键词
脉冲电弧
发散特性
数学模型
pulsed arc
films' thickness
mathematical model