期刊文献+

脉冲电弧沉积类金刚石薄膜的厚度建模 被引量:1

Thickness modeling of diamond-like carbon films by pulsed vacuum arc deposition
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摘要 从理论和实验出发,分析脉冲电弧源的放电机理,讨论了脉冲电弧源发散特性,得到影响膜厚空间分布的主要因素,建立膜厚空间分布和主要因素之间的数学模型,结果表明和实验数据吻合。 Discusses theoretically and experimentaly the discharge mechanicsm and diverging feature of pulsed arc source, thus obtaining the main influencing factors on the films' thickness. Then, a mathematical model is developed between the main influencing factors and films' thickness. The solution to the model shows its conformity with experimental results.
出处 《真空》 CAS 北大核心 2005年第6期33-35,共3页 Vacuum
基金 陕西省教育厅专项科研计划项目资助(项目编号:02JK14)
关键词 脉冲电弧 发散特性 数学模型 pulsed arc films' thickness mathematical model
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参考文献5

  • 1Lifshitz Y,Kasi S R,Rabais J W.Subplantation model for film growth from hyperthermal species[J].Physical Review B,1990,41(15):10468-10479. 被引量:1
  • 2Lifshitz Y,Lempert G W,Grossman E.Substantation of subplantation Model for film growth by atomic force microscopy[J].Physical Review Letter,1994,72(17):2753-2756. 被引量:1
  • 3Robertson J.deposition mechanism of a-c and a-c:H[J]. J Non-Cryst Solids,1993,164~166:1115-1118. 被引量:1
  • 4Boxman R L.Vacuum arc deposition;Early history and recrnt development[C],19th Int.symp.on Discharge and Electrical Insulation in vacuum,2000,Xi'an. 被引量:1
  • 5蔡长龙..脉冲真空电弧离子镀及类金刚石薄膜的研究[D].西安交通大学,2003:

同被引文献5

  • 1梁海锋,严一心.类金刚石薄膜光学特性的椭偏法研究[J].真空科学与技术学报,2005,25(4):287-289. 被引量:10
  • 2Lifshitz Y,Kasi S R,Rabais J W.Subplantation model for film growth from hyperthermal species[J].Physical Review B,1990,41(15):10468-10479. 被引量:1
  • 3Lifshitz Y,Lempert G D,Grossman E.Substantation of subplantation model for film growth by atomic force microscopy[J].Physical Review Letter,1994,72(17):2753-2756. 被引量:1
  • 4Robertson J.Deposition mechanism of a-c and a-c∶H[J].J Non-Cryst Solids,1993,164-166:1115-1118. 被引量:1
  • 5Boxman R L.Vacuum arc deposition;Early history and recrnt development[C].19th Int.symp.on Dischardess and Electrical Insulation in vacuum,2000.Xi'an. 被引量:1

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