摘要
由水热腐蚀技术制得的铁钝化多孔硅作为基底,采用浸渍镀膜技术成功制备了铁钝化多孔硅/铜纳米复合薄膜.利用扫描电镜(SEM)、XRD等分析手段对比研究了铁钝化多孔硅在沉积前与沉积后的结构变化特点以及沉积时间对所沉积的铜薄膜的结构的影响.结果表明,在浸渍一定时间后,铜/铁钝化多孔硅纳米复合薄膜继承了新鲜制备的铁钝化多孔硅的结构特点;同时,在溶液浓度保持不变的情况下,随着反应时间的的延长,铜的沉积量逐渐增加,铜纳米颗粒的平均晶粒尺寸逐渐长大.
In this article, the Cu/Iron-passivated porous silicon composite nano-films were prepared by electroless plating. The structural features' changes of Iron-passivated porous silicon were studied after being plated, and the dependence of the morphology of Cu/Iron-passivated porous silicon on the immersion time were investigated by SEM and XRD.
出处
《河南科学》
2005年第6期798-800,共3页
Henan Science
关键词
铁钝化多孔硅
规则阵列
浸渍镀膜技术
铁钝化多孔硅/铜纳米复合薄膜
Iron-passivated porous silicon
regular array
immersion plating
Cu/Iron-passivated porous silicon composite nano-films