摘要
介绍了X射线宽带多层膜材料W和B4C的选定方法,依据伯宁(BERNING)公式确定出了在0.154 nm处X射线宽带多层膜的最佳膜对数.引入适当的评价函数,利用具有全局寻优特性且效率较高的遗传算法,在波长0.154 nm处优化设计出了掠入射角(θ)0.5°～0.9°范围内反射率值达到40%的宽角度宽带多层膜.宽带多层膜反射镜采用磁控溅射方法制备,并用X射线衍射仪对样品进行了检测,结果表明在掠入射角(2θ)1.0°～1.8°之间的相对反射率光谱曲线比较平坦.
A method of selecting and confirming materials with W and B4C for X-ray broadband multilayer film is presented. The minimum bilayers number of X-ray broadband multilayer film has been confirmed by using BERNING formula at the wavelength 0. 154 nm. After introducing the suitable merit function, a broad angular broadband W/B4C multilayer film has been designed successfully by using genetic algorithm. The flat reflectance of broadband multilayer film is 40% in the wavelength 0. 154 nm at the grazing incidence angel （θ） of 0.5°-0.9°. The multilayer film has been fabricated on the magnetron sputtering system. A flat relative reflectance spectrum curve has been measured at the grazing incidence angle （θ） of 1.0°-1.8°by X-ray diffractometer.
出处
《光学学报》
EI
CAS
CSCD
北大核心
2005年第10期1433-1435,共3页
Acta Optica Sinica
关键词
X射线光学
宽带多层膜
评价函数
遗传算法
磁控溅射
X-ray optics
broadband multilayer
merit function
genetic algorithms
magnetron sputtering
