摘要
研究了在酸性条件下,硅酸根与钼酸铵反应生成硅钼黄,用抗坏血酸将其还原生成硅钼蓝杂多酸,硅钼蓝杂多酸在pH 9.6左右的NH3·H2O-NH4C1缓冲溶液中,在峰电位为-1.1 V(vs.SCE)处产生一灵敏一阶导数极谱波.在25 mL溶液中,导数极谱波高与二氧化硅量在0.02～12μg呈线性关系,检出限为0.012 μg,相对标准偏差为0.46%～0.62%,回收率为97%～105%.在EDTA掩蔽下,用于氧化铁中二氧化硅的测定,获得了满意结果.
Under acidic conditions, silicic acid radical reacts with ammonium molybdate to form a silicomolybdenum yellow heteropoly acid, which is reduced to a silicomolybdenum heteropoly blue by ascorbic acid. In NH3-HiO-NH4C1 buffer（pH 9.6） the silicomolybdenum heteropoly blue can produce a sensitive polarographic wave with peak potential at - 1.1 V （vs. SCE）. The first derivative peak height is directly proportional to the silicon dioxide concentration in the range of 0.02 - 12 g/25 mL and the detection limit was 0.012 μg/25 mL. The relative standard deviations are 0.46 % -0.62 % and the recoveries are 97% - 105 %. The method has been used to the determination of silicon dioxide in the ferric oxide in the presence of EDTA as masking reagent with satisfactory results.
出处
《冶金分析》
EI
CAS
CSCD
北大核心
2005年第4期68-70,共3页
Metallurgical Analysis
关键词
二氧化硅
硅钼蓝杂多酸
极谱吸附波
silicon dioxide
silicomolybdenum blue heteropoly acid
adsorptive polarographic wave
