期刊文献+

人工合成金刚石技术比较 被引量:5

Man-made Diamond Technique Comparison
下载PDF
导出
摘要 静压法是当前工业合成金刚石的主要的合成手段.合成工业用金刚石主要采用静压法中的静压触媒法.合成宝石级金刚石主要采用静压晶种触媒法生产.通过静压法中的直接变换法,纯净的多晶石墨棒可以在短时间内转化为多晶金刚石.二十世纪八十年代还出现了一种在低压下生长金刚石的新方法———化学气相沉积法(CVD) ,目前只能用于制备金刚石薄膜.本文通过总结比较各种金刚石合成技术,提出了利用激光控制金刚石生长的设想。 Static high-pressure method is the main technique to synthesize diamond in industry.Generally,industrial diamonds are synthesized by graphite with metal catalyst under high-pressure and high-temperature,and gem-quality diamonds are synthesized by using seed crystal under high-pressure and high-temperature.Ultra hard polycrystalline diamond can be synthesized from graphite by direct conversion under static high pressure.A new technique,chemical vapor deposition method,appeared in the 80s,but it is only used to synthesize diamond films now.By comparing these techniques,we designed a device to control the growth of diamond by high-energy laser.By this way,the diamond's quality can be increased.
出处 《首都师范大学学报(自然科学版)》 2005年第2期26-29,共4页 Journal of Capital Normal University:Natural Science Edition
  • 相关文献

参考文献8

  • 1Tetsuo Irifune, Ayako Kurio,Shizue Sakamoto,Tom Inoue, Hitoshi Sumiya. Ultrahard polycrystalline diamond from graphite. Nature,2002,421:599. 被引量:1
  • 2Jansen F. The Deposition of Diamond by Filament Techniques. J Vae Sei Technol, 1990, A8:3785. 被引量:1
  • 3R. S. Yalamanchi, Diamond Growth in Combustion Flames J. Appl. Phys. 1990,68,5941 Y. Tezeng,“Growth of Diamond films on Silicon from an Oxygen-acetylene Flame”, Appl. Phys. Lett. 1990,56 : 134. 被引量:1
  • 4Setsuo Nakao. Hydrgeon-Etching Effect of Substrate on Deposition of Diamond Films by DC Plasma CVD. Jpn J Appl Phys, 1991,7A:L1195-L1198. 被引量:1
  • 5G. Amaratunga. Crystalline Diamond Growth in Films Deposited from a CH4/Ar RF Plasma. Appl Phys Lett, 1989,55:634. 被引量:1
  • 6Masayuki Nuntoni. Effects of Oxygen Addition on Diamond Film Growth by Electron Cyclotron Resonance Microwave Plasma CVD Apparatus ,Jpn J Appl Phys, 1991,7A : L1199 - L1202. 被引量:1
  • 7Hiroshi Kawarada. Large Area Chemical Vapor Deposition of Diamond Particles and Films Using Mageneto-Microwave Plasma.Jpn J Appl Phys, 1987,26 : L1032 - L1034. 被引量:1
  • 8Tzeng Y. Growth of Diamond films on Silicon from an Oxygen-acetylene Flame. Appl Phys Lett, 1990,56:134. 被引量:1

同被引文献44

引证文献5

二级引证文献7

相关作者

内容加载中请稍等...

相关机构

内容加载中请稍等...

相关主题

内容加载中请稍等...

浏览历史

内容加载中请稍等...
;
使用帮助 返回顶部