摘要
本文在介绍近场光学显微镜原理的基础上,对近场光学显微技术进行了一定深度的探讨,并着重研究了纳米级探针的制作和纳米级样品与探针间距的控制这两个近场光学显微技术中的关键问题,说明了近场光学显微探针的工作方式,阐述了近场光学成像的衬度类型,介绍了近场光学显微技术在多个领域的应用。在参考大量国内外最新研究成果的基础上,提出了一些个人的见解。
In this paper,the principle of the near-field optics microscope is introduced,the technique of near-field optics microscope is explored, and the two key problems with the fabrication of nano-probes and the control of distance between the nano-probe and the nano-object are researched. The operating mode of the NSOM nano-probe is explained. The contrast type of near-field optical imaging is expounded. The application of NSOM in many fields is introduced. Some personal opinions are proposed based on the great number of outcomes of scientific reseraches at home and abroad.
出处
《应用光学》
CAS
CSCD
2005年第3期36-40,共5页
Journal of Applied Optics
关键词
近场光学显微技术
探针
样品-探针间距
near-field optics microscope technique
probe
pitch of probe and object
