摘要
在不同温度衬底上射频磁控溅射沉积ZrO2－12wt％Y2O3薄膜进行了不同方式的退火后处理。其一为1000℃大气气氛下的热退火处理，其二为高真空渗氧条件下的电子束退火处理。退火前后的相结构和显微形貌的研究表明，退火前的沉积膜相组成与沉积过程中衬底温度有关，退火后的沉积膜相组成与退火方式有关，其形貌特征经不同形式退火显示出明显的差别。
The r. f. magnetron sputtering deghted ZrO2-12wt% Y2O3 films on the subetrate at different temperatures were annealed with two different methods. One method is the thermal annealing in air at 1000℃ for 1 hour,the other is the electron beam annealing in the condition of vacuum under about 5 ×10-3 Pa with a leakage of oxygen gas. These films before and after annealing were investigated by XRD and morphology analysis. The results show that the phase composition of r. f. magnetron sputtering depeited ZrO2-12wt% Y2O3 film depends highly on the subetrate temperature during production,and is also related to the annealing methods,and the characterized morphology of the films is greatly affected by different annealing techniques.
出处
《真空科学与技术》
CSCD
1994年第1期16-20,共5页
Vacuum Science and Technology
基金
国家自然科学基金
关键词
薄膜
退火
相结构
氧化锆
氧化钇
ZrO_2-12wt% Y_2O_3 films, Annealing, Phase structure
