摘要
聚对二甲苯是一种可应用于光学器件和晶体保护的新型高分子材料。采用真空化学气相沉积法制备聚对二甲苯薄膜,并通过提拉镀膜法在其表面镀制一层SiO2增透膜,可提高薄膜的透射率至90%以上。用FT-IR、紫外-近红外分光光度计和XPS对聚对二甲苯/SiO2复合薄膜结构和光学性能进行了表征和测试,并初步研究了薄膜受紫外光辐照而产生光氧化现象的机理。
Poly (p-xylylene) is a novel material applied in protection of optical components and crystals. Poly (p-xylylene) film was prepared by vacuum Chemical Vapor Deposition process. It is shown that the transmittance of film can be raised to more than 90% by SiO2 anti-reflective coating on its surface. FTIR, UV-visible spectra and XPS were used to characterize the structure and optical property of films. The mechanism of photooxidation of Poly (p-xylylene) film is also prelimiary analyzed.
出处
《功能材料与器件学报》
EI
CAS
CSCD
北大核心
2005年第1期38-42,共5页
Journal of Functional Materials and Devices
基金
国家自然科学基金重点项目(20133040)资助课题
国家高技术863计划项目(2002AA842052)资助课题
关键词
聚对二甲苯
SiO2增透膜
光氧化
Poly(p-xylylene)
SiO_2 anti-reflective coating
photooxidation
