摘要
用磁控溅射法制备ITO膜所留下的ITO废靶料是一种经高压高温成型的铟、锡氧化物陶瓷烧结体,它耐腐蚀耐高温,但富含稀有金属铟,其回收再生技术特别是其中的铟、锡分离复杂,本文介绍几种回收方法并加以评述。
ITO waste targets left after preparing ITO film in Magnetron Sputtering is a Tin-Indium oxide sinter formed by high temperature and high pressure.It is high temperature resistant and corrosion resistant,but concentrates Indium.The technology of recycling Indium from the target and separating Indium is very complex.This paper introduces some technology in recycling Indium from the waste target.
出处
《中国资源综合利用》
2005年第2期14-16,共3页
China Resources Comprehensive Utilization