摘要
从优化膜系、控制膜厚、改善膜面、均衡应力等四个方面开展了实验研究工作 ,为制备 1 31 5nm 4 5°高反射镜提供一些判断实验数据 ,并提出改进的方法 ,从而使制备的高反射膜取得满意的结果 :反射率大于 99.8%。
In order to make 45° high reflection mirror at 1315nm and offer some experimental data, we discuss the following aspects-optimization of the design of the thin films, the control of the depth of the thin films, the improvement of the surface of the thin films and the balance of the stress in the thin films. we give some methods to improve the characteristic of the thin films, and finally get the satisfied results about the making high reflection mirror:R>99.85%.
出处
《强激光与粒子束》
EI
CAS
CSCD
北大核心
2000年第B11期83-86,共4页
High Power Laser and Particle Beams
基金
国家863激光技术领域资助课题
关键词
高反射镜
膜厚
应力
high reflection mirror
depth of thin film
stressd
