摘要
报导了用DMD-450机镀制大口径(φ125mm)紫外(248nm)均匀高反膜及增透膜,工装简单实用,解决了大口径基片的放置,用可见光监控紫外膜涂镀及膜片均匀性三个问题。摸索了氧化饴膜料蒸发工艺.结果达到激光器要求.
Coating of large aperture((?)125mm)ultraviolet(248nm)film with high reflective or antireflective quality using DMD-450 coating machine is reported.Its technology and equipment are simple but practical.Three difficulties,putting large substrate in coating equipment DMD-450,monitoring for ultraviolet dielectric film by visible light,and the uniformity of thefilm,are overcome.The technology of evaporating hafnium oxide film-material is explored.The reults are good enough to be used in laser device.
出处
《哈尔滨工业大学学报》
EI
CAS
CSCD
北大核心
1993年第5期96-100,共5页
Journal of Harbin Institute of Technology
关键词
大口径
紫外膜
镀制
介质膜
Mask
large aperture
ultraviolet film
