摘要
论文探讨了采用固着磨料高速研磨进行纳米级加工的有关问题。采用固着磨料高速研磨加工技术加工光电器件 ,使工件已加工表面粗糙度达Ra2 .88nm ,平面度达 19nm ,不仅实现了纳米级加工 ,而且还实现了高效率、低成本加工。
In the paper, some problems about high speed nanometer l apping with solid abrasives was discussed.A high speed solid abrasives lapping t echnology was used for machining photoelectric elements. The result shown that t he surface roughness of workpiece reached to Ra288nm and flatness reached 19nm . The technology not only realized nanometer machining but also realized machini ng at high efficiency and low cost.
出处
《长春理工大学学报（自然科学版）》
2004年第3期18-19,共2页
Journal of Changchun University of Science and Technology(Natural Science Edition)
关键词
光电器件
纳米级加工
高速研磨
nanometer
photoelectric elements
high speed lapping
