摘要
本文研究了在不同温度的基片上进行磁控溅射 ,氮流量对Fe N薄膜的磁性和结构的影响。实验表明 ,基片温度为 2 0 0℃有助于提高Fe N薄膜的软磁性能。基片为室温和 10 0℃ ,氮流量在 0～ 2sccm范围内变化时 ,未发现γ' Fe4 N和α″ Fe16N2 ,薄膜中只有N在α Fe中的固溶体。基片温度 2 0 0℃ ,氮流量大于 1.0sccm时 ,薄膜中出现γ′ Fe4 N ,但仍未发现α″ Fe16N2 ,加氮后薄膜的软磁性能明显小于纯铁。当氮流量是 1.0sccm ,温度 2 0 0℃时 ,矫顽力达到最小值 ,Hc =30 6.6A/m。当氮流量是 0 .5sccm ,温度是 2 0 0℃时 ,饱和磁化强度达到 4πMs =2 .3T。
The changes of soft magnetic properties and structure with nitrogen flow rate have been investigated for Fe-N films prepared by magnetron sputtering on glass substrates at different temperatures. Substrate heated at 200℃ during film deposition is effective in improving soft magnetic property. When the nitrogen flow rate is changed from 0 to 2 sccm, only α-Fe nitrogen solid solution is found in Fe-N film deposited at room temperature and 100℃. When the substrate temperature is 200℃ and the nitrogen flow rate is higher than 1 sccm, a mixture of α-Fe and γ′-Fe 4N is formed in Fe-N film. α″-Fe 16 N 2 phase is not found in this study . The soft magnetic property of α-Fe film incorporated of nitrogen is better than that of pure iron. At 200℃, the lowest coercivity(H c=306.6A/m)is obtained at 1.0 sccm nitrogen flow rate, and the highest saturation magnetization(4πM s=2.3T)at 0.5 sccm.
出处
《金属功能材料》
2000年第3期27-31,共5页
Metallic Functional Materials
基金
国家自然科学基金委员会资助项目
关键词
饱和磁化强度
矫顽力
磁控溅射
Fe-N膜
saturation magnetization, coercivity, magnetron sputtering, Fe-N film
