摘要
利用改进后的对靶磁控溅射系统,以N2/Ar混合气体为溅射气体,在未加热的Si(111)衬底上沉积FeCoN薄膜.采用X射线衍射仪(XRD)、透射电子显微镜(TEM)、扫描电子显微镜(SEM)和超导量子干涉仪(SQUID)研究不同Co靶溅射功率对FeCoN薄膜样品的结构、形貌和磁性性能的影响.结果表明:固定Fe靶功率为160 W(电流I=0.4 A),当Co靶功率为2.4 W(I=0.04 A)时,薄膜由Co溶入ε-Fe3N中形成的ε-(Fe,Co)3N化合物相构成;当Co靶功率为58 W(I=0.2 A)时,获得了Fe3N/Co3N化合物相,薄膜的饱和磁化强度(Ms)为151.47 A.m2/kg,矫顽力(Hc)为3.68 kA/m;当Co靶功率为11.9 W(I=0.07 A)时,制备出具有高饱和磁化强度的α″-(Fe,Co)16 N2化合物相,薄膜的Ms=265.08 A.m2/kg,Hc=8.24 kA/m.
Fe-Co-N films were deposited on an unheated Si（111） substrate by means of developed facing-target magnetron sputtering with N2/Ar as sputtering gas.The effect of various Co target power on the structure,morphology and magnetic properties of FeCoN films were investigated by X-ray diffraction（XRD）,transmission electron microscopy（TEM）,scanning electron microscopy（SEM） and superconducting quantum interference device（SQUID）,respectively.The results show that when the input power on Fe target was 160 W and Co target power was 2.4 W,the thin films with ε-（Fe,Co）3N were synthesized;when Co target power was 58 W,paramagnetic Co3N phase appeared with ferromagnetic phase Fe3N,saturation magnetization（Ms） of thin film is 151.47 A·m2/kg,coercivity（Hc） is 3.68 kA/m.When Co target power was 11.9 W（I=0.07 A）,α″-（Fe,Co）16N2 phase was obtained with a high Ms of 265.08 A·m2/kg and Hc of 8.24 kA/m.
出处
《吉林大学学报（理学版）》
CAS
CSCD
北大核心
2011年第1期125-130,共6页
Journal of Jilin University:Science Edition
基金
科技部基础专项科研项目基金(批准号:2008FY230100)
吉林省科技厅项目基金(批准号:20070501)
