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Effect of Substrate Nitridation on Properties of Thick GaN Film Grown by Hydride Vapour Phase Epitaxy
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作者 YEHao-hua YUGuang-hui +2 位作者 LEIBen-lian QIMing LIAi-zhen 《Semiconductor Photonics and Technology》 CAS 2005年第1期28-31,共4页
Thick GaN films were grown on the sapphire substrate by hydride vapour phase epitaxy. The properties of GaN films were found to be significantly influenced by the duration of exposing the sapphire substrate to ammonia... Thick GaN films were grown on the sapphire substrate by hydride vapour phase epitaxy. The properties of GaN films were found to be significantly influenced by the duration of exposing the sapphire substrate to ammonia prior to the GaN growth initiation. The crystalline quality of GaN films revealed by high resolution X-ray diffraction were strongly dependent on the nitridation time, which determined substrate surface topography. The different nitridation schemes strongly affected the morphology of GaN overlayers resulting in the blue shift of the main excitonic peak in photoluminescence spectra at room temperature. 展开更多
关键词 substrate nitridation GaN hydride vapour phase epitaxy
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Reactive Ion Etching of GaAs,GaSb,InP and InAs in Cl_2/Ar Plasma 被引量:2
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作者 HONGTing ZHANGYong-gang LIUTian-dong 《Semiconductor Photonics and Technology》 CAS 2004年第3期203-207,共5页
Reactive ion etching characteristics of GaAs,GaSb,InP and InAs using Cl2/Ar plasma have been investigated,it is that,etching rates and etching profiles as functions of etching time,gas flow ratio and RF power.Etch rat... Reactive ion etching characteristics of GaAs,GaSb,InP and InAs using Cl2/Ar plasma have been investigated,it is that,etching rates and etching profiles as functions of etching time,gas flow ratio and RF power.Etch rates of above 0.45 μm/min and 1.2 μm/min have been obtained in etching of GaAs and GaSb respectively, while very slow etch rates (<40 nm/min) were observed in etching of In-containing materials,which were linearly increased with the applied RF power.Etched surfaces have remained smooth over a wide range of plasma conditions in the etching of GaAs,InP and InAs,however,were partly blackened in etching of GaSb due to a rough appearance. 展开更多
关键词 Reactive ion etching Ⅲ-Ⅴ compounds Plasma
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Thermal Conductivities of III-V Antimonides
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作者 ZHUCheng ZHANGYong-gang LIAi-zhen 《Semiconductor Photonics and Technology》 CAS 2004年第3期208-212,共5页
Thermal parameters of various III-V antimonides,especially the quaternary lattice matched to GaSb or InAs substrates as well as some strained ternaries,have been investigated theoretically.Results show that at most co... Thermal parameters of various III-V antimonides,especially the quaternary lattice matched to GaSb or InAs substrates as well as some strained ternaries,have been investigated theoretically.Results show that at most composition region many ternary and quaternary antimonides exhibit rather lower thermal conductivity compared to related binaries,and the reason has been discussed.The thermal designing rule of the lasers and other power devices using those antimonides also has been discussed. 展开更多
关键词 Thermal conductivity ANTIMONIDE TERNARY QUATERNARY
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