The Reynolds-averaged general dynamic equation(RAGDE)for the nanoparticle size distribution function is derived,including the contribution to particle coagulation resulting from the fluctuating concentration.The equat...The Reynolds-averaged general dynamic equation(RAGDE)for the nanoparticle size distribution function is derived,including the contribution to particle coagulation resulting from the fluctuating concentration.The equation together with that of a turbulent gas flow is solved numerically in the turbulent flow of a ventilation chamber with a jet on the wall based on the proposed model relating the fluctuating coagulation to the gradient of mean concentration.Some results are compared with the experimental data.The results show that the proposed model relating the fluctuating coagulation to the gradient of mean concentration is reasonable,and it is necessary to consider the contribution to coagulation resulting from the fluctuating concentration in such a flow.The changes of the particle number concentration M_(0) and the geometric mean diameter dg are more obvious in the core area of the jet,but less obvious in other areas.With the increase in the initial particle number concentration m00,the values of M_(0) and the standard deviation of the particle sizeσdecrease,but the value of d_(g) increases.The decrease in the initial particle diameter leads to the reduction of M_(0) andσand the increase in d_(g).With the increase in the Reynolds number,particles have few chances of collision,and hence the coagulation rate is reduced,leading to the increase in M_(0) andσand the decrease in d_(g).展开更多
Non-spherical colloidal silica nanoparticle was prepared by a simple new method, and its particle size distribution and shape morphology were characterized by dynamic light scattering(DLS) and the Focus Ion Beam(FIB) ...Non-spherical colloidal silica nanoparticle was prepared by a simple new method, and its particle size distribution and shape morphology were characterized by dynamic light scattering(DLS) and the Focus Ion Beam(FIB) system. This kind of novel colloidal silica particles can be well used in chemical mechanical polishing(CMP) of sapphire wafer surface. And the polishing test proves that non-spherical colloidal silica slurry shows much higher material removal rate(MRR) with higher coefficient of friction(COF) when compared to traditional large spherical colloidal silica slurry with particle size 80 nm by DLS. Besides, sapphire wafer polished by non-spherical abrasive also has a good surface roughness of 0.460 6 nm. Therefore, non-spherical colloidal silica has shown great potential in the CMP field because of its higher MRR and better surface roughness.展开更多
基金Project supported by the Major Program of the National Natural Science Foundation of China(No.91852102)。
文摘The Reynolds-averaged general dynamic equation(RAGDE)for the nanoparticle size distribution function is derived,including the contribution to particle coagulation resulting from the fluctuating concentration.The equation together with that of a turbulent gas flow is solved numerically in the turbulent flow of a ventilation chamber with a jet on the wall based on the proposed model relating the fluctuating coagulation to the gradient of mean concentration.Some results are compared with the experimental data.The results show that the proposed model relating the fluctuating coagulation to the gradient of mean concentration is reasonable,and it is necessary to consider the contribution to coagulation resulting from the fluctuating concentration in such a flow.The changes of the particle number concentration M_(0) and the geometric mean diameter dg are more obvious in the core area of the jet,but less obvious in other areas.With the increase in the initial particle number concentration m00,the values of M_(0) and the standard deviation of the particle sizeσdecrease,but the value of d_(g) increases.The decrease in the initial particle diameter leads to the reduction of M_(0) andσand the increase in d_(g).With the increase in the Reynolds number,particles have few chances of collision,and hence the coagulation rate is reduced,leading to the increase in M_(0) andσand the decrease in d_(g).
基金Funded by the National Major Scientific and Technological Special Project during the Twelfth Five-year Plan Period(No.2009ZX02030-1)the National Natural Science Foundation of China(No.51205387)the Science and Technology Commission of Shanghai(No.11nm0500300),the Science and Technology Commission of Shanghai(No.14XD1425300)
文摘Non-spherical colloidal silica nanoparticle was prepared by a simple new method, and its particle size distribution and shape morphology were characterized by dynamic light scattering(DLS) and the Focus Ion Beam(FIB) system. This kind of novel colloidal silica particles can be well used in chemical mechanical polishing(CMP) of sapphire wafer surface. And the polishing test proves that non-spherical colloidal silica slurry shows much higher material removal rate(MRR) with higher coefficient of friction(COF) when compared to traditional large spherical colloidal silica slurry with particle size 80 nm by DLS. Besides, sapphire wafer polished by non-spherical abrasive also has a good surface roughness of 0.460 6 nm. Therefore, non-spherical colloidal silica has shown great potential in the CMP field because of its higher MRR and better surface roughness.
