Two-dimensional(2D)layered materials have attracted extensive research interest in the field of high-performance photodetection due to their high carrier mobility,tunable bandgap,stability,other excellent properties.H...Two-dimensional(2D)layered materials have attracted extensive research interest in the field of high-performance photodetection due to their high carrier mobility,tunable bandgap,stability,other excellent properties.Herein,we propose a gate-tunable,high-performance,self-driving,wide detection range phototransistor based on a 2D PtSe_(2)on silicon-oninsulator(SOI).Benefiting from the strong built-in electric field of the PtSe_(2)/Si heterostructure,the phototransistor has a fast response time(rise/fall time)of 36.7/32.6μs.The PtSe_(2)/Si phototransistor exhibits excellent photodetection performance over a broad spectral range from ultraviolet to near-infrared,including a responsivity of 1.07 A/W and a specific detectivity of 6.60×10^(9)Jones under 808 nm illumination at zero gate voltage.The responsivity and specific detectivity of PtSe_(2)/Si phototransistor at 5 V gate voltage are increased to 13.85 A/W and 1.90×10^(10) Jones under 808 nm illumination.Furthermore,the fabricated PtSe_(2)/Si phototransistor array shows excellent uniformity,reproducibility,long-term stability in terms of photoresponse performance with negligible variation between pixel cells.The architecture of present PtSe_(2)/Si on SOI platform paves a new way of a general strategy to realize high-performance photodetectors by combining the advantages of both 2D materials and conventional semiconductors which is compatible with current Si-complementary metal oxide semiconductor(CMOS)process.展开更多
A power amplifier’s linearity determines the emission signal’s quality and the efficiency of the system.Nonlinear distortion can result in system bit error,out-of-band radiation,and interference with other channels,...A power amplifier’s linearity determines the emission signal’s quality and the efficiency of the system.Nonlinear distortion can result in system bit error,out-of-band radiation,and interference with other channels,which severely influence communication system’s quality and reliability.Starting from the third-order intermodulation point of the milimeter wave(mm-Wave)power amplifiers,the circuit’s nonlinearity is compensated for.The analysis,design,and implementation of linear class AB mm-Wave power amplifiers based on GlobalFoundries 45 nm CMOS silicon-on-insulator(SOI)technology are presented.Three single-ended and differential stacked power amplifiers have been implemented based on cascode cells and triple cascode cells operating in U-band frequencies.According to nonlinear analysis and on-wafer measurements,designs based on triple cascode cells outperform those based on cascode cells.Using single-ended measurements,the differential power amplifier achieves a measured peak power-added efficiency(PAE)of 47.2%and a saturated output power(P_(sat))of 25.2 dBm at 44 GHz.The amplifier achieves a P_(sat)higher than 23 dBm and a maximum PAE higher than 25%in the measured bandwidth from 44 GHz to 50 GHz.展开更多
Silicon micro-ring resonators （MRRs） are compact and versatile devices whose periodic frequency response can be exploited for a wide range of applications. In this paper, we review our recent work on linear all-opti...Silicon micro-ring resonators （MRRs） are compact and versatile devices whose periodic frequency response can be exploited for a wide range of applications. In this paper, we review our recent work on linear all-optical signal processing applications using silicon MRRs as passive filters. We focus on applications such as modulation format conversion, differential phase-shift keying （DPSK） demodulation, modulation speed enhancement of directly modulated lasers （DMLs）, and monocycle pulse generation. The possibility to implement polarization diversity circuits, which reduce the polarization dependence of standard silicon MRRs, is illustrated on the particular example of DPSK demodulation.展开更多
介绍了一种低功耗高速垂直腔表面发射激光器(VCSEL)驱动器的设计。该芯片设计使用国产0.13μm SOI CMOS工艺,能提供6~8mA可调调制电流及4~7mA可调偏置电流。驱动电路采用多级级联放大并结合无源电感并联峰化技术,用以拓展带宽。测试结...介绍了一种低功耗高速垂直腔表面发射激光器(VCSEL)驱动器的设计。该芯片设计使用国产0.13μm SOI CMOS工艺,能提供6~8mA可调调制电流及4~7mA可调偏置电流。驱动电路采用多级级联放大并结合无源电感并联峰化技术,用以拓展带宽。测试结果表明,该电路在1.2V单电源工作电压下,最高工作速率可达5Gbit/s,总功耗仅为48mW。展开更多
Mode matching is the key to improve the performance of micro-machined vibrating ring gyroscopes.Mass and stiffness asymmetries can lend to normal modes badly mismatch for gyroscopes fabricated by single-crystal silico...Mode matching is the key to improve the performance of micro-machined vibrating ring gyroscopes.Mass and stiffness asymmetries can lend to normal modes badly mismatch for gyroscopes fabricated by single-crystal silicon.The mismatch of the normal nodes results in large normal mode frequency split and degraded sensitivity.To address this issue,a Silicon-On-Insulator(SOI) wafer is used to fabricate the sensor chips.Meanwhile,a compensate disk and the backside coated negative photo resist(AZ303) is employed to weaken the Lag and Footing effect during the Deep Reactive Ion Etching(DRIE) process.Test results reveal that frequency split between the normal modes is of less than 10 Hz before the following electronic tuning.Thus,the mode matching of the electromagnetic vibrating ring gyroscope is probable to be realized.展开更多
本文提出一种高k介质电导增强SOI LDMOS新结构(HK CE SOI LDMOS),并研究其机理.HK CE SOI LDMOS的特征是在漂移区两侧引入高k介质,反向阻断时,高k介质对漂移区进行自适应辅助耗尽,实现漂移区三维RESURF效应并调制电场,因而提高器件耐压...本文提出一种高k介质电导增强SOI LDMOS新结构(HK CE SOI LDMOS),并研究其机理.HK CE SOI LDMOS的特征是在漂移区两侧引入高k介质,反向阻断时,高k介质对漂移区进行自适应辅助耗尽,实现漂移区三维RESURF效应并调制电场,因而提高器件耐压和漂移区浓度并降低导通电阻.借助三维仿真研究耐压、比导通电阻与器件结构参数之间的关系.结果表明,HK CE SOI LDMOS与常规超结SOI LDMOS相比,耐压提高16%—18%,同时比导通电阻降低13%—20%,且缓解了由衬底辅助耗尽效应带来的电荷非平衡问题.展开更多
基金the National Natural Science Foundation of China(Nos.62090030/62090031,51872257,51672244,and 62274145)the National Key R&D Program of China(No.2021YFA1200502)+1 种基金the Natural Science Foundation of Zhejiang Province(No.LZ20F040001)the Zhejiang Province Key R&D Pprogram(No.2020C01120).
文摘Two-dimensional(2D)layered materials have attracted extensive research interest in the field of high-performance photodetection due to their high carrier mobility,tunable bandgap,stability,other excellent properties.Herein,we propose a gate-tunable,high-performance,self-driving,wide detection range phototransistor based on a 2D PtSe_(2)on silicon-oninsulator(SOI).Benefiting from the strong built-in electric field of the PtSe_(2)/Si heterostructure,the phototransistor has a fast response time(rise/fall time)of 36.7/32.6μs.The PtSe_(2)/Si phototransistor exhibits excellent photodetection performance over a broad spectral range from ultraviolet to near-infrared,including a responsivity of 1.07 A/W and a specific detectivity of 6.60×10^(9)Jones under 808 nm illumination at zero gate voltage.The responsivity and specific detectivity of PtSe_(2)/Si phototransistor at 5 V gate voltage are increased to 13.85 A/W and 1.90×10^(10) Jones under 808 nm illumination.Furthermore,the fabricated PtSe_(2)/Si phototransistor array shows excellent uniformity,reproducibility,long-term stability in terms of photoresponse performance with negligible variation between pixel cells.The architecture of present PtSe_(2)/Si on SOI platform paves a new way of a general strategy to realize high-performance photodetectors by combining the advantages of both 2D materials and conventional semiconductors which is compatible with current Si-complementary metal oxide semiconductor(CMOS)process.
基金Project supported by the National Natural Science Foundation of China(No.62001232)。
文摘A power amplifier’s linearity determines the emission signal’s quality and the efficiency of the system.Nonlinear distortion can result in system bit error,out-of-band radiation,and interference with other channels,which severely influence communication system’s quality and reliability.Starting from the third-order intermodulation point of the milimeter wave(mm-Wave)power amplifiers,the circuit’s nonlinearity is compensated for.The analysis,design,and implementation of linear class AB mm-Wave power amplifiers based on GlobalFoundries 45 nm CMOS silicon-on-insulator(SOI)technology are presented.Three single-ended and differential stacked power amplifiers have been implemented based on cascode cells and triple cascode cells operating in U-band frequencies.According to nonlinear analysis and on-wafer measurements,designs based on triple cascode cells outperform those based on cascode cells.Using single-ended measurements,the differential power amplifier achieves a measured peak power-added efficiency(PAE)of 47.2%and a saturated output power(P_(sat))of 25.2 dBm at 44 GHz.The amplifier achieves a P_(sat)higher than 23 dBm and a maximum PAE higher than 25%in the measured bandwidth from 44 GHz to 50 GHz.
文摘Silicon micro-ring resonators （MRRs） are compact and versatile devices whose periodic frequency response can be exploited for a wide range of applications. In this paper, we review our recent work on linear all-optical signal processing applications using silicon MRRs as passive filters. We focus on applications such as modulation format conversion, differential phase-shift keying （DPSK） demodulation, modulation speed enhancement of directly modulated lasers （DMLs）, and monocycle pulse generation. The possibility to implement polarization diversity circuits, which reduce the polarization dependence of standard silicon MRRs, is illustrated on the particular example of DPSK demodulation.
文摘介绍了一种低功耗高速垂直腔表面发射激光器(VCSEL)驱动器的设计。该芯片设计使用国产0.13μm SOI CMOS工艺,能提供6~8mA可调调制电流及4~7mA可调偏置电流。驱动电路采用多级级联放大并结合无源电感并联峰化技术,用以拓展带宽。测试结果表明,该电路在1.2V单电源工作电压下,最高工作速率可达5Gbit/s,总功耗仅为48mW。
基金Supported by the National Natural Science Foundation of China(No.61072022)
文摘Mode matching is the key to improve the performance of micro-machined vibrating ring gyroscopes.Mass and stiffness asymmetries can lend to normal modes badly mismatch for gyroscopes fabricated by single-crystal silicon.The mismatch of the normal nodes results in large normal mode frequency split and degraded sensitivity.To address this issue,a Silicon-On-Insulator(SOI) wafer is used to fabricate the sensor chips.Meanwhile,a compensate disk and the backside coated negative photo resist(AZ303) is employed to weaken the Lag and Footing effect during the Deep Reactive Ion Etching(DRIE) process.Test results reveal that frequency split between the normal modes is of less than 10 Hz before the following electronic tuning.Thus,the mode matching of the electromagnetic vibrating ring gyroscope is probable to be realized.
文摘本文提出一种高k介质电导增强SOI LDMOS新结构(HK CE SOI LDMOS),并研究其机理.HK CE SOI LDMOS的特征是在漂移区两侧引入高k介质,反向阻断时,高k介质对漂移区进行自适应辅助耗尽,实现漂移区三维RESURF效应并调制电场,因而提高器件耐压和漂移区浓度并降低导通电阻.借助三维仿真研究耐压、比导通电阻与器件结构参数之间的关系.结果表明,HK CE SOI LDMOS与常规超结SOI LDMOS相比,耐压提高16%—18%,同时比导通电阻降低13%—20%,且缓解了由衬底辅助耗尽效应带来的电荷非平衡问题.
