以单片机远程温度控制系统为例,给出了一种基于LabVIEW与Proteus的测控仿真实验系统的设计方法,利用Proteus中的AT89C51单片机仿真下位机运行,实现温度的采集、A/D转换器的控制及向上位机传输数据等功能。利用LabVIEW仿真上位机运行,对...以单片机远程温度控制系统为例,给出了一种基于LabVIEW与Proteus的测控仿真实验系统的设计方法,利用Proteus中的AT89C51单片机仿真下位机运行,实现温度的采集、A/D转换器的控制及向上位机传输数据等功能。利用LabVIEW仿真上位机运行,对接收的温度信息进行PID控制,将PID调整量输出给单片机,使其输出占空比可调的PWM波,以控制OVEN的工作状态,达到远程控制系统温度的目的。LabVIEW设计的监控界面直观地实现了对温度信号的实时监控和仿真参数的设置。两软件利用Virtual Serial Port Driver 6.9虚拟的一对串口进行RS-232的串行通信。仿真结果表明,该方法可以有效地验证测控系统设计的正确性,对于测控实验教学与工程项目开发的前期实验,具有很好的实用性。展开更多
Image quality is one of the most important specifications of optical lithography tool and is affected notably by temperature, vibration, and contamination of projection lens（PL）. Traditional method of local temperat...Image quality is one of the most important specifications of optical lithography tool and is affected notably by temperature, vibration, and contamination of projection lens（PL）. Traditional method of local temperature control is easier to introduce vibration and contamination, so temperature control system with multi-closed loops is developed to control the temperature inside the PL, and to isolate the influence of vibration and contamination. A new remote indirect-temperature-control（RITC） method is proposed in which cooling water is circulated to perform indirect-temperature-control of the PL. Heater and cooler embedded temperature control unit（TCU） is used to condition the temperature of the cooling water, and the TCU must be kept away from the PL so that the influence of vibration and contamination can be avoided. A new multi-closed loops control structure incorporating an internal cascade control structure（CCS） and an external parallel cascade control structure（PCCS） is designed to prevent large inertia, multi-delay, and multi-disturbance of the RITC system. A nonlinear proportional-integral（PI） algorithm is applied to further enhance the convergence rate and precision of the control process. Contrast experiments of different control loops and algorithms were implemented to verify the impact on the control performance. It is shown that the temperature control system with multi-closed loops reaches a precision specification at ±0.006 ℃ with fast convergence rate, strong robustness, and self-adaptability. This method has been successfully used in an optical lithography tool which produces a pattern of 100 nm critical dimension（CD）, and its performances are satisfactory.展开更多
文摘以单片机远程温度控制系统为例,给出了一种基于LabVIEW与Proteus的测控仿真实验系统的设计方法,利用Proteus中的AT89C51单片机仿真下位机运行,实现温度的采集、A/D转换器的控制及向上位机传输数据等功能。利用LabVIEW仿真上位机运行,对接收的温度信息进行PID控制,将PID调整量输出给单片机,使其输出占空比可调的PWM波,以控制OVEN的工作状态,达到远程控制系统温度的目的。LabVIEW设计的监控界面直观地实现了对温度信号的实时监控和仿真参数的设置。两软件利用Virtual Serial Port Driver 6.9虚拟的一对串口进行RS-232的串行通信。仿真结果表明,该方法可以有效地验证测控系统设计的正确性,对于测控实验教学与工程项目开发的前期实验,具有很好的实用性。
基金supported by National Hi-tech Research and Development Program of China(863 Program, Grant No. 2002AA4Z300)National Basic Research Program of China (973 Program, Grant No. 2009CB724205)
文摘Image quality is one of the most important specifications of optical lithography tool and is affected notably by temperature, vibration, and contamination of projection lens（PL）. Traditional method of local temperature control is easier to introduce vibration and contamination, so temperature control system with multi-closed loops is developed to control the temperature inside the PL, and to isolate the influence of vibration and contamination. A new remote indirect-temperature-control（RITC） method is proposed in which cooling water is circulated to perform indirect-temperature-control of the PL. Heater and cooler embedded temperature control unit（TCU） is used to condition the temperature of the cooling water, and the TCU must be kept away from the PL so that the influence of vibration and contamination can be avoided. A new multi-closed loops control structure incorporating an internal cascade control structure（CCS） and an external parallel cascade control structure（PCCS） is designed to prevent large inertia, multi-delay, and multi-disturbance of the RITC system. A nonlinear proportional-integral（PI） algorithm is applied to further enhance the convergence rate and precision of the control process. Contrast experiments of different control loops and algorithms were implemented to verify the impact on the control performance. It is shown that the temperature control system with multi-closed loops reaches a precision specification at ±0.006 ℃ with fast convergence rate, strong robustness, and self-adaptability. This method has been successfully used in an optical lithography tool which produces a pattern of 100 nm critical dimension（CD）, and its performances are satisfactory.
