This work aims to determine the characteristic PN junction diode, subject to a reverse polarization, while I （breakdown voltage） of the inverse current in a GaAs specifying the parameters that influence the breakdow...This work aims to determine the characteristic PN junction diode, subject to a reverse polarization, while I （breakdown voltage） of the inverse current in a GaAs specifying the parameters that influence the breakdown voltage of the diode. In this work, we simulated the behavior of the ionization phenomenon by impact breakdown by avalanche of the PN junctions, subject to an inverse polarization. We will take into account both the trapping model in a stationary regime in the P＋N structure using like material of basis the Ⅲ-Ⅴ compounds and mainly the GaAs semi-insulating in which the deep centers have in important densities. We are talking about the model of trapping in the space charge region （SCR） and that is the trap density donor and acceptor states. The carrier crossing the space charge region （SCR） of W thickness creates N electron-hole pairs： for every created pair, the electron and the hole are swept quickly by the electric field, each in an opposite direction, which comes back, according to an already accepted reasoning, to the crossing of the space charge region （SCR） by an electron or a hole. So the even N pair created by the initial particle provoke N2 ionizations and so forth. The study of the physical and electrical behaviour of semiconductors is based on the influence of the presence of deep centers on the characteristic I（V） current-tension, which requires the calculation of the electrostatic potential, the electric field, the integral of ionization, the density of the states traps, the diffusion current of minority in the regions （1） and （3）, the current thermal generation in the region （2）, the leakage current in the surface, and the breakdown voltage.展开更多
本文制备了一种基于局部化学掺杂的单壁碳纳米管(SWCNT) p-i-n结二极管。在此器件中,单根SWCNT沟道的两端分别被掺杂成p型和n型,沟道中段保留为本征状态,从而在SWCNT中形成具有较强内建电场的p-i-n结,表现出二极管特性。所制二极管器件...本文制备了一种基于局部化学掺杂的单壁碳纳米管(SWCNT) p-i-n结二极管。在此器件中,单根SWCNT沟道的两端分别被掺杂成p型和n型,沟道中段保留为本征状态,从而在SWCNT中形成具有较强内建电场的p-i-n结,表现出二极管特性。所制二极管器件具有高的器件性能,其整流比可达10~3数量级、反向饱和电流仅为23 p A。此外,简要探讨了该结构二极管的工作原理。展开更多
文摘This work aims to determine the characteristic PN junction diode, subject to a reverse polarization, while I （breakdown voltage） of the inverse current in a GaAs specifying the parameters that influence the breakdown voltage of the diode. In this work, we simulated the behavior of the ionization phenomenon by impact breakdown by avalanche of the PN junctions, subject to an inverse polarization. We will take into account both the trapping model in a stationary regime in the P＋N structure using like material of basis the Ⅲ-Ⅴ compounds and mainly the GaAs semi-insulating in which the deep centers have in important densities. We are talking about the model of trapping in the space charge region （SCR） and that is the trap density donor and acceptor states. The carrier crossing the space charge region （SCR） of W thickness creates N electron-hole pairs： for every created pair, the electron and the hole are swept quickly by the electric field, each in an opposite direction, which comes back, according to an already accepted reasoning, to the crossing of the space charge region （SCR） by an electron or a hole. So the even N pair created by the initial particle provoke N2 ionizations and so forth. The study of the physical and electrical behaviour of semiconductors is based on the influence of the presence of deep centers on the characteristic I（V） current-tension, which requires the calculation of the electrostatic potential, the electric field, the integral of ionization, the density of the states traps, the diffusion current of minority in the regions （1） and （3）, the current thermal generation in the region （2）, the leakage current in the surface, and the breakdown voltage.
文摘本文制备了一种基于局部化学掺杂的单壁碳纳米管(SWCNT) p-i-n结二极管。在此器件中,单根SWCNT沟道的两端分别被掺杂成p型和n型,沟道中段保留为本征状态,从而在SWCNT中形成具有较强内建电场的p-i-n结,表现出二极管特性。所制二极管器件具有高的器件性能,其整流比可达10~3数量级、反向饱和电流仅为23 p A。此外,简要探讨了该结构二极管的工作原理。
