用投掷法和有限元差分法计算了单周期调制掺杂GaAs/AlGaAs双量子阱的能带结构,得到基态能级与第一激发态的能级差为43.3 meV,并由此推算得到产生载流子横向转移效应的电场强度为1.2～1.8 k V/cm之间.采用MBE技术生长了所涉及的双量子阱...用投掷法和有限元差分法计算了单周期调制掺杂GaAs/AlGaAs双量子阱的能带结构,得到基态能级与第一激发态的能级差为43.3 meV,并由此推算得到产生载流子横向转移效应的电场强度为1.2～1.8 k V/cm之间.采用MBE技术生长了所涉及的双量子阱结构,通过优化退火条件,获得了较理想的金属—半导体接触条件.在此基础上,测得在电场强度为1.5 k V/cm时,电流—电压曲线呈现出负阻特性.该电场强度区别于GaAs耿氏效应的电场强度,由此判定,产生微分负阻的机理是电子由高迁移率导电层到低迁移率导电层的横向转移所致,即实空间转移.展开更多
Tunneling field effect transistors（TFETs） based on two-dimensional materials are promising contenders to the traditional metal oxide semiconductor field effect transistor, mainly due to potential applications in low...Tunneling field effect transistors（TFETs） based on two-dimensional materials are promising contenders to the traditional metal oxide semiconductor field effect transistor, mainly due to potential applications in low power devices. Here,we investigate the TFETs based on two different integration types： in-plane and vertical heterostructures composed of two kinds of layered phosphorous（β-P and δ-P） by ab initio quantum transport simulations. NDR effects have been observed in both in-plane and vertical heterostructures, and the effects become significant with the highest peak-to-valley ratio（PVR）when the intrinsic region length is near zero. Compared with the in-plane TFET based on β-P and δ-P, better performance with a higher on/off current ratio of - 10-6 and a steeper subthreshold swing（SS） of - 23 mV/dec is achieved in the vertical TFET. Such differences in the NDR effects, on/off current ratio and SS are attributed to the distinct interaction nature of theβ-P and δ-P layers in the in-plane and vertical heterostructures.展开更多
基金This project was supported by the Science and Technology Project of Jilin Provincial Education Department(JJKH20220828KJ)the Natural Science FoundationofChangchunNormal University(2020-005).
文摘用投掷法和有限元差分法计算了单周期调制掺杂GaAs/AlGaAs双量子阱的能带结构,得到基态能级与第一激发态的能级差为43.3 meV,并由此推算得到产生载流子横向转移效应的电场强度为1.2～1.8 k V/cm之间.采用MBE技术生长了所涉及的双量子阱结构,通过优化退火条件,获得了较理想的金属—半导体接触条件.在此基础上,测得在电场强度为1.5 k V/cm时,电流—电压曲线呈现出负阻特性.该电场强度区别于GaAs耿氏效应的电场强度,由此判定,产生微分负阻的机理是电子由高迁移率导电层到低迁移率导电层的横向转移所致,即实空间转移.
基金Project supported by the National Natural Science Foundation of China(Grant Nos.11604019,61574020,and 61376018)the Ministry of Science and Technology of China(Grant No.2016YFA0301300)+1 种基金the Fund of State Key Laboratory of Information Photonics and Optical Communications(Beijing University of Posts and Telecommunications),Chinathe Fundamental Research Funds for the Central Universities,China(Grant No.2016RCGD22)
文摘Tunneling field effect transistors（TFETs） based on two-dimensional materials are promising contenders to the traditional metal oxide semiconductor field effect transistor, mainly due to potential applications in low power devices. Here,we investigate the TFETs based on two different integration types： in-plane and vertical heterostructures composed of two kinds of layered phosphorous（β-P and δ-P） by ab initio quantum transport simulations. NDR effects have been observed in both in-plane and vertical heterostructures, and the effects become significant with the highest peak-to-valley ratio（PVR）when the intrinsic region length is near zero. Compared with the in-plane TFET based on β-P and δ-P, better performance with a higher on/off current ratio of - 10-6 and a steeper subthreshold swing（SS） of - 23 mV/dec is achieved in the vertical TFET. Such differences in the NDR effects, on/off current ratio and SS are attributed to the distinct interaction nature of theβ-P and δ-P layers in the in-plane and vertical heterostructures.
