An available surface modification process of nano-Si3N4 was given using KH-5 60 as modifying agent and acetone as dispersion medium. Nano-Si3N4 suspension w as of the greatest stability when the nano-Si3N4 powder was ...An available surface modification process of nano-Si3N4 was given using KH-5 60 as modifying agent and acetone as dispersion medium. Nano-Si3N4 suspension w as of the greatest stability when the nano-Si3N4 powder was modified with prope r amount of KH-560, which was 1%(wt) of the amount of nano-Si3N4 powder. Elem ents of C, O and Si were detected on the surface of the modified nano-Si3N4 pow der by means of XPS. The TEM of the suspension showed that the average particle size of nano-Si3N4 became smaller and dispersibility of nano-Si3N4 was improve d in the medium of acetone when the nano-Si3N4 powder was modified with proper amount of KH-560. The results obtained showed that KH-560 had been bound on th e surface of nano-Si3N4 particles.展开更多
文摘An available surface modification process of nano-Si3N4 was given using KH-5 60 as modifying agent and acetone as dispersion medium. Nano-Si3N4 suspension w as of the greatest stability when the nano-Si3N4 powder was modified with prope r amount of KH-560, which was 1%(wt) of the amount of nano-Si3N4 powder. Elem ents of C, O and Si were detected on the surface of the modified nano-Si3N4 pow der by means of XPS. The TEM of the suspension showed that the average particle size of nano-Si3N4 became smaller and dispersibility of nano-Si3N4 was improve d in the medium of acetone when the nano-Si3N4 powder was modified with proper amount of KH-560. The results obtained showed that KH-560 had been bound on th e surface of nano-Si3N4 particles.
