In this paper,the study of projection properties of two-level factorials in view of geometry is reported.The concept of uniformity pattern is defined.Based on this new concept,criteria of uniformity resolution and min...In this paper,the study of projection properties of two-level factorials in view of geometry is reported.The concept of uniformity pattern is defined.Based on this new concept,criteria of uniformity resolution and minimum projection uniformity are proposed for comparing two-level factorials.Relationship between minimum projection uniformity and other criteria such as minimum aberration,generalized minimum aberration and orthogonality is made explict.This close relationship raises the hope of improving the connection between uniform design theory and factorial design theory.Our results provide a justification of orthogonality,minimum aberration,and generalized minimum aberration from a natural geometrical interpretation.展开更多
In this article, we consider the characterization problem in design theory. The objective is to characterize minimum projection uniformity for two-level designs in terms of their complementary designs. Here, the compl...In this article, we consider the characterization problem in design theory. The objective is to characterize minimum projection uniformity for two-level designs in terms of their complementary designs. Here, the complementary design means a design in which all the Hamming distances of any two runs are the same, which generalizes the concept of a pair of complementary designs in the literature. Based on relationships of the uniformity pattern between a pair of complementary designs, we propose a minimum projection uniformity （MPU） rule to assess and compare two-level factorials.展开更多
We study the complementary design problem, which is to express the uniformity pattern of a q-level design in terms of that of its complementary design. Here, a pair of complementary designs form a design in which all ...We study the complementary design problem, which is to express the uniformity pattern of a q-level design in terms of that of its complementary design. Here, a pair of complementary designs form a design in which all the Hamming distances of any two distinct runs are the same, and the uniformity pattern proposed by H. Qin, Z. Wang, and K. Chatterjee [J. Statist. Plann. Inference, 2012, 142： 1170-11771 comes from discrete discrepancy for q-level designs. Based on relationships of the uniformity pattern between a pair of complementary designs, we propose a minimum projection uniformity rule to assess and compare q-level factorials.展开更多
基金partially supported by the Hong Kong RGC grant,RGC/HKBU 2044/02Pthe National Natural Science Foundation of China(Grant No.10071029)+1 种基金the Project-sponsored by SRF for ROCS(SEM)the NSF of Hubei Province for the second author.
文摘In this paper,the study of projection properties of two-level factorials in view of geometry is reported.The concept of uniformity pattern is defined.Based on this new concept,criteria of uniformity resolution and minimum projection uniformity are proposed for comparing two-level factorials.Relationship between minimum projection uniformity and other criteria such as minimum aberration,generalized minimum aberration and orthogonality is made explict.This close relationship raises the hope of improving the connection between uniform design theory and factorial design theory.Our results provide a justification of orthogonality,minimum aberration,and generalized minimum aberration from a natural geometrical interpretation.
基金supported by the NSF of China (10671080)NCET (06-672)the Key Project of Chinese Ministry of Education (105119)
文摘In this article, we consider the characterization problem in design theory. The objective is to characterize minimum projection uniformity for two-level designs in terms of their complementary designs. Here, the complementary design means a design in which all the Hamming distances of any two runs are the same, which generalizes the concept of a pair of complementary designs in the literature. Based on relationships of the uniformity pattern between a pair of complementary designs, we propose a minimum projection uniformity （MPU） rule to assess and compare two-level factorials.
基金Acknowledgements The authors greatly appreciate helpful suggestions of the referees that greatly improved the paper. This work was supported in part by the National Natural Science Foundation of China （Grant Nos. 11271147, 11401596）.
文摘We study the complementary design problem, which is to express the uniformity pattern of a q-level design in terms of that of its complementary design. Here, a pair of complementary designs form a design in which all the Hamming distances of any two distinct runs are the same, and the uniformity pattern proposed by H. Qin, Z. Wang, and K. Chatterjee [J. Statist. Plann. Inference, 2012, 142： 1170-11771 comes from discrete discrepancy for q-level designs. Based on relationships of the uniformity pattern between a pair of complementary designs, we propose a minimum projection uniformity rule to assess and compare q-level factorials.
