In the past decades,Moore’s law drives the semiconductor industry to continuously shrink the critical size of transistors down to 7 nm.As transistors further downscaling to smaller sizes,the law reaches its limitatio...In the past decades,Moore’s law drives the semiconductor industry to continuously shrink the critical size of transistors down to 7 nm.As transistors further downscaling to smaller sizes,the law reaches its limitation,and the increase of transistors density on the chip decelerates.Up to now,extreme ultraviolet lithography has been used in some key steps,and it is facing alignment precision and high costs for high-volume manufacturing.Meanwhile,the introduction of new materials and 3D complex structures brings serious challenges for top-down methods.Thus,bottom-up schemes are believed to be necessary methods combined with the top-down processes.In this article,atomic level deposition methods are reviewed and categorized to extend Moore’s law and beyond.Firstly,the deposition brings lateral angstrom resolution to the vertical direction as well as top-down etching,such as double patterning,transfer of nanowires,deposition of nanotubes,and so on.Secondly,various template-assisted selective deposition methods including dielectric templates,inhibitors and correction steps have been utilized for the alignment of 3D complex structures.Higher resolution can be achieved by inherently selective deposition,and the underlying selective mechanism is discussed.Finally,the requirements for higher precision and efficiency manufacturing are also discussed,including the equipment,integration processes,scale-up issues,etc.The article reviews low dimensional manufacturing and integration of 3D complex structures for the extension of Moore’s law in semiconductor fields,and emerging fields including but not limited to energy,catalysis,sensor and biomedicals.展开更多
Going beyond the analytical model of the holistic state in rule of law discussion, we can classify the rule of law into national and local levels based on the stages and increments of its execution. The phenomenon of ...Going beyond the analytical model of the holistic state in rule of law discussion, we can classify the rule of law into national and local levels based on the stages and increments of its execution. The phenomenon of the local rule of law reflects the stages and incremental progress of building a rule of law China. It has a realistic foundation in society and a profound basis in legal theory. Comprehensively advancing the rule of law in China necessitates giving encouragement and support to construction of the rule of law at the local level. The attempts and experiments of local government enable us to explore and innovate the developmental model of the socialist rule of law with Chinese characteristics. The rule of law at the local level is embodied in three dimensions： ＂text--action---concept.＂ Assessment mechanisms and indicators for the local construction of the rule of law should also be established in accordance with this framework. The building of the rule of law at the local level should be synchronized with assessment of the rule of law. We need to optimize top-level design, conduct evaluations of local legislation, improve local rule of law work performance assessment and use a nile of law index to assess the local rule of law in an overall manner.展开更多
基金the National Natural Science Foundation of China(51835005,51702106,51911540476,and 51575217)HUST state key lab project(DMETKF2019003)。
文摘In the past decades,Moore’s law drives the semiconductor industry to continuously shrink the critical size of transistors down to 7 nm.As transistors further downscaling to smaller sizes,the law reaches its limitation,and the increase of transistors density on the chip decelerates.Up to now,extreme ultraviolet lithography has been used in some key steps,and it is facing alignment precision and high costs for high-volume manufacturing.Meanwhile,the introduction of new materials and 3D complex structures brings serious challenges for top-down methods.Thus,bottom-up schemes are believed to be necessary methods combined with the top-down processes.In this article,atomic level deposition methods are reviewed and categorized to extend Moore’s law and beyond.Firstly,the deposition brings lateral angstrom resolution to the vertical direction as well as top-down etching,such as double patterning,transfer of nanowires,deposition of nanotubes,and so on.Secondly,various template-assisted selective deposition methods including dielectric templates,inhibitors and correction steps have been utilized for the alignment of 3D complex structures.Higher resolution can be achieved by inherently selective deposition,and the underlying selective mechanism is discussed.Finally,the requirements for higher precision and efficiency manufacturing are also discussed,including the equipment,integration processes,scale-up issues,etc.The article reviews low dimensional manufacturing and integration of 3D complex structures for the extension of Moore’s law in semiconductor fields,and emerging fields including but not limited to energy,catalysis,sensor and biomedicals.
基金the research results of"Research on the Sinification,Modernization and Populrization of Marxist Jurisprudential Theory,"a key project of the National Social Science Foundation(10AFX001)
文摘Going beyond the analytical model of the holistic state in rule of law discussion, we can classify the rule of law into national and local levels based on the stages and increments of its execution. The phenomenon of the local rule of law reflects the stages and incremental progress of building a rule of law China. It has a realistic foundation in society and a profound basis in legal theory. Comprehensively advancing the rule of law in China necessitates giving encouragement and support to construction of the rule of law at the local level. The attempts and experiments of local government enable us to explore and innovate the developmental model of the socialist rule of law with Chinese characteristics. The rule of law at the local level is embodied in three dimensions： ＂text--action---concept.＂ Assessment mechanisms and indicators for the local construction of the rule of law should also be established in accordance with this framework. The building of the rule of law at the local level should be synchronized with assessment of the rule of law. We need to optimize top-level design, conduct evaluations of local legislation, improve local rule of law work performance assessment and use a nile of law index to assess the local rule of law in an overall manner.
