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Si–Ge based vertical tunnel field-effect transistor of junction-less structure with improved sensitivity using dielectric modulation for biosensing applications
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作者 Lucky Agarwal Varun Mishra +2 位作者 Ravi Prakash Dwivedi Vishal Goyal Shweta Tripathi 《Chinese Physics B》 SCIE EI CAS CSCD 2023年第12期644-651,共8页
A dielectric modulation strategy for gate oxide material that enhances the sensing performance of biosensors in junction-less vertical tunnel field effect transistors(TFETs)is reported.The junction-less technique,in w... A dielectric modulation strategy for gate oxide material that enhances the sensing performance of biosensors in junction-less vertical tunnel field effect transistors(TFETs)is reported.The junction-less technique,in which metals with specific work functions are deposited on the source region to modulate the channel conductivity,is used to provide the necessary doping for the proper functioning of the device.TCAD simulation studies of the proposed structure and junction structure have been compared,and showed an enhanced rectification of 10^(4) times.The proposed structure is designed to have a nanocavity of length 10 nm on the left-and right-hand sides of the fixed gate dielectric,which improves the biosensor capture area,and hence the sensitivity.By considering neutral and charged biomolecules with different dielectric constants,TCAD simulation studies were compared for their sensitivities.The off-state current IOFFcan be used as a suitable sensing parameter because it has been observed that the proposed sensor exhibits a significant variation in drain current.Additionally,it has been investigated how positively and negatively charged biomolecules affect the drain current and threshold voltage.To explore the device performance when the nanogaps are fully filled,half filled and unevenly filled,extensive TCAD simulations have been run.The proposed TFET structure is further benchmarked to other structures to show its better sensing capabilities. 展开更多
关键词 biomolecules high-k dielectric junction-less vertical tunnel field effect transistor(TFET)
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Compact analytical model of double gate junction-less field effect transistor comprising quantum-mechanical effect 被引量:1
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作者 Shoubhik Gupta Bahniman Ghosh Shiromani Balmukund Rahi 《Journal of Semiconductors》 EI CAS CSCD 2015年第2期42-47,共6页
We investigate the quantum-mechanical effects on the electrical properties of the double-gate j unction- less field effect transistors. The quantum-mechanical effect, or carrier energy-quantization effects on the thre... We investigate the quantum-mechanical effects on the electrical properties of the double-gate j unction- less field effect transistors. The quantum-mechanical effect, or carrier energy-quantization effects on the threshold voltage, of DG-JLFET are analytically modeled and incorporated in the Duarte et al. model and then verified by TCAD simulation. 展开更多
关键词 quantum-mechanical effect junction-less transistor threshold voltage oxide thickness
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新型无结型晶体管特性仿真及性能优化设计
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作者 孙川川 高瑛珂 +3 位作者 王农 李圣龙 赵云富 梁贤赓 《微电子学》 CAS 北大核心 2020年第1期106-111,共6页
随着晶体管特征尺寸缩小至10 nm以下,传统Si基MOSFET面临诸多挑战,而新型沟道材料和器件结构将有望进一步提升器件性能。基于绝缘体上锗衬底的无结型晶体管(GOI-JLT)制作工艺简单、电学特性优良,有望在空间电子系统中应用。利用TCAD仿... 随着晶体管特征尺寸缩小至10 nm以下,传统Si基MOSFET面临诸多挑战,而新型沟道材料和器件结构将有望进一步提升器件性能。基于绝缘体上锗衬底的无结型晶体管(GOI-JLT)制作工艺简单、电学特性优良,有望在空间电子系统中应用。利用TCAD仿真软件Sentaurus,研究了GOI-JLT的电学特性,提出一种通过调节沟道掺杂分布来优化器件性能的方法。仿真结果表明,沟道采用高斯掺杂分布,能显著降低器件关态漏电流(降低约三个数量级),提高开关比(提高约三个数量级),抑制短沟道效应。 展开更多
关键词 无结型晶体管 绝缘体上锗 沟道掺杂分布 短沟道效应 TCAD仿真
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