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空心圆管端点附近等离子体源离子注入过程中鞘层的时空演化 被引量:6
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作者 刘成森 王德真 《物理学报》 SCIE EI CAS CSCD 北大核心 2003年第1期109-114,共6页
等离子体源离子注入过程中 ,鞘层的演化规律直接影响到离子注入到材料中的深度进而影响材料表面的性质和结构 ,对材料的不同部位这种影响是不同的 .利用无碰撞两维流体动力学模型 ,研究了有限上升时间的电压脉冲作用下 ,共轴放置附加零... 等离子体源离子注入过程中 ,鞘层的演化规律直接影响到离子注入到材料中的深度进而影响材料表面的性质和结构 ,对材料的不同部位这种影响是不同的 .利用无碰撞两维流体动力学模型 ,研究了有限上升时间的电压脉冲作用下 ,共轴放置附加零电极的半无限空心圆管端点附近等离子体源离子注入过程中 ,鞘层的时空演化规律 .通过计算得到了鞘层内随时间变化的电势分布和离子密度分布 ,计算了端点附近材料表面处的离子流密度分布和注入剂量分布随时间的变化规律 .计算机模拟结果显示了空心圆管内部、外部及端点表面处的离子流密度分布和注入剂量分布存在很大差异 . 展开更多
关键词 空心圆管端点 等离子体源离子注入 鞘层 流体模型 离子密度 离子注入剂量 时空演化
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半圆形容器等离子体源离子注入过程中离子动力学的两维PIC计算机模拟 被引量:8
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作者 刘成森 王德真 +1 位作者 刘天伟 王艳辉 《物理学报》 SCIE EI CAS CSCD 北大核心 2008年第10期6450-6456,共7页
利用两维particle-in-cell方法研究了半圆形容器表面等离子体源离子注入过程中鞘层的时空演化规律.详尽考察了鞘层内随时间变化的电势分布和离子密度分布规律,离子在鞘层中的运动轨迹和运动状态,得到了半圆容器内、外表面和边缘平面上... 利用两维particle-in-cell方法研究了半圆形容器表面等离子体源离子注入过程中鞘层的时空演化规律.详尽考察了鞘层内随时间变化的电势分布和离子密度分布规律,离子在鞘层中的运动轨迹和运动状态,得到了半圆容器内、外表面和边缘平面上各点离子注入剂量分布规律,获得了工件表面各点注入离子的入射角分布规律.研究结果揭示了半圆容器边缘附近鞘层中离子聚焦现象,以及离子聚焦现象导致工件表面注入剂量分布和注入角度分布存在很大不均匀的基本物理规律. 展开更多
关键词 等离子体源离子注入 鞘层 两维particle-in-cell方法 离子运动轨迹
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真空电弧研究进展综述 被引量:8
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作者 朱世明 袁召 +1 位作者 赵来军 刘明泽 《电工材料》 CAS 2012年第1期38-43,共6页
介绍了国内外真空电弧的研究进展,综述了真空电弧的主要研究方向。真空电弧以电流过零点为界,分为燃弧阶段和弧后介质恢复阶段。燃弧阶段的研究点主要有阴极斑点特性、阳极斑点特性和弧柱区特性;弧后介质恢复阶段的研究点主要有弧后电... 介绍了国内外真空电弧的研究进展,综述了真空电弧的主要研究方向。真空电弧以电流过零点为界,分为燃弧阶段和弧后介质恢复阶段。燃弧阶段的研究点主要有阴极斑点特性、阳极斑点特性和弧柱区特性;弧后介质恢复阶段的研究点主要有弧后电流特性和鞘层发展特性。最后指出了目前真空电弧研究存在的不足,讨论了真空电弧今后的研究方向。 展开更多
关键词 真空电弧 介质恢复 阴极斑点 阳极斑点 离子鞘
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大气条件下厘米级棒-板间隙负极性电晕放电中流注的产生与发展机制 被引量:2
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作者 李长云 李岩青 于永进 《电工技术学报》 EI CSCD 北大核心 2024年第3期887-900,共14页
该文研究了大气条件下棒-板间隙中流注放电的产生与发展机理。首先,基于Raether判据和Meek判据,建立了在给定放电条件下流注的发展长度与由电子球表面电场表示的空间电场强度之间的关系,可用其判断流注放电的发展过程;然后,建立了流注... 该文研究了大气条件下棒-板间隙中流注放电的产生与发展机理。首先,基于Raether判据和Meek判据,建立了在给定放电条件下流注的发展长度与由电子球表面电场表示的空间电场强度之间的关系,可用其判断流注放电的发展过程;然后,建立了流注放电的等离子体化学反应仿真模型,分析了流注放电发展过程中带电粒子、平均电子能量及电场强度的分布规律;最后,开展了大气条件下负直流棒-板放电实验,分析了流注型电晕放电的发展过程。研究表明,等离子体化学反应模型用于计算厘米级间隙的流注放电的可靠性较高,放电初期以氮气和氧气的电离反应为主,且只有主放电通道的电子崩在放电中期发展为流注,而放电后期负离子层变厚形成鞘层。实验结果表明,流注型电晕由流注和漫射辉光区域组成,且流注的形状、位置随加压时间发生变化,负离子层的积聚是漫射辉光区域形成的主要原因。该文所得结论可为明确负极性电晕放电中流注放电的产生与发展机制,以及等离子体的制备等提供理论依据。 展开更多
关键词 流注型电晕 辉光放电 Raether判据 Meek判据 离子鞘 棒-板间隙
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二维无碰撞离子引出过程的数值模拟 被引量:6
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作者 严敏 应纯同 +1 位作者 王德武 诸旭辉 《清华大学学报(自然科学版)》 EI CAS CSCD 北大核心 1996年第6期5-10,共6页
利用流体理论电子平衡模型,对二维不考虑带电粒子碰撞的激光分离同位素(AVLIS)离子引出过程进行了数值模拟,包括对不同收集方式进行了模拟和对比,研究了离子引出过程中的物理机理及物理量的空间分布特点,表明等离子体电位略... 利用流体理论电子平衡模型,对二维不考虑带电粒子碰撞的激光分离同位素(AVLIS)离子引出过程进行了数值模拟,包括对不同收集方式进行了模拟和对比,研究了离子引出过程中的物理机理及物理量的空间分布特点,表明等离子体电位略高于阳极电位,并在离子引出过程中基本保持不变;电子温度越高等离子体电位越高,离子引出时间越短;对称收集方式的离子引出时间短且离子逃逸量也少。 展开更多
关键词 离子引出 等离子体 激光 同位素 分离 数值模拟
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2D hybrid-PIC simulation of the two and three-grid system of ion thruster 被引量:3
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作者 Yanhui JIA Juanjuan CHEN +3 位作者 Ning GUO Xinfeng SUN Chenchen WU Tianping ZHANG 《Plasma Science and Technology》 SCIE EI CAS CSCD 2018年第10期127-134,共8页
A 2D hybrid-PIC simulation model is proposed to investigate the beam extraction phenomena of the ion thruster. In which the electrons of the plasma sheath upstream the accelerator grid are assumed as particles while t... A 2D hybrid-PIC simulation model is proposed to investigate the beam extraction phenomena of the ion thruster. In which the electrons of the plasma sheath upstream the accelerator grid are assumed as particles while the downstream are fluid for improving the calculation efficiency. The ion transparency, plasma sheath formation, ion beam extraction characteristic of a two- and three-grid system have been compared in detail in this paper. From the comparison of the appearing time of the under-perveance phenomena in the two- and three-grid system, it illustrated that the two grid system has the wider operation range of the plasma densities than the three-grid one. 展开更多
关键词 ion thruster grid system plasma sheath ion beam
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碰撞效应对入射到射频偏压电极上离子能量分布和角度分布的影响 被引量:3
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作者 邱华檀 王友年 马腾才 《物理学报》 SCIE EI CAS CSCD 北大核心 2002年第6期1332-1337,共6页
考虑了离子与中性粒子的弹性碰撞和电荷交换碰撞效应 ,建立了一套描述射频等离子体鞘层动力学特性的自洽模型 ,并利用Monte Carlo模拟方法研究了入射到电极上的离子的能量分布和角度分布 .数值结果表明 :随着放电气压增加 ,入射到电极... 考虑了离子与中性粒子的弹性碰撞和电荷交换碰撞效应 ,建立了一套描述射频等离子体鞘层动力学特性的自洽模型 ,并利用Monte Carlo模拟方法研究了入射到电极上的离子的能量分布和角度分布 .数值结果表明 :随着放电气压增加 ,入射到电极上离子的能量分布逐渐地由双峰分布变成单峰分布 ,而且低能离子的数目也逐渐地增加 .入射到电极上的离子呈小角分布 ,而且放电气压等参数对角度分布的影响不是太明显 . 展开更多
关键词 碰撞效应 射频偏压电极 离子能量分布 角度分布 射频放电 等离子体 鞘层 动力学
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An integrative mathematical model of microwave ion thruster for mHz-frequency thrust noise analysis
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作者 Xiang NIU Hui LIU Daren YU 《Chinese Journal of Aeronautics》 SCIE EI CAS CSCD 2024年第4期121-136,共16页
Many high-precision space missions need thrusters to produce thrust with low noise to compensate for disturbances and ensure satellite platform stability. Microwave ion thruster is characterized with a wide thrust ran... Many high-precision space missions need thrusters to produce thrust with low noise to compensate for disturbances and ensure satellite platform stability. Microwave ion thruster is characterized with a wide thrust range and potential for these missions. A cost-effective and accurate mathematical model is crucial for mHz-frequency thrust noise analysis and feedback controller design. The Particle-In-Cell(PIC) and global models are two common simulation tools. The PIC model is characterized with high accuracy but huge computation cost, which is difficult to analyze long-time performance characteristics. Now, the global model is only used for the discharge chamber with low accuracy and cannot reflect ion extraction properties. In this paper, an integrative mathematical model is built for a 1-cm microwave ion thruster and can reflect ion beamlet divergence and impingement on the Accelerator Grid(AG). Simulation results show good agreement with experiments at 0.06 sccm. However, the model demonstrates worse consistency with experiments when the flux increases to 0.1 sccm, which may be because the influence of neutral gas on the Electron Cyclotron Resonance(ECR) is not considered in the model. A long-time(1000 s) simulation is conducted with this model under 35 μN. It takes 3 hrs, and the thrust noise reaches 1 μN/Hz^(0.5) at 1 mHz. 展开更多
关键词 Electric propulsion Microwave ion thruster Integrative model sheath property ion beamlet divergence Thrust noise Plasma
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Electric Potential in Surface Produced Negative Ion Source with Magnetic Field Increasing Toward a Wall
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作者 Azusa FUKANO Akiyoshi HATAYAMA 《Plasma Science and Technology》 SCIE EI CAS CSCD 2013年第3期266-270,共5页
Electric potential near a wall for plasma with the surface produced negative ions with magnetic field increasing toward a wall is investigated analytically. The potential profile is derived analytically by using a pla... Electric potential near a wall for plasma with the surface produced negative ions with magnetic field increasing toward a wall is investigated analytically. The potential profile is derived analytically by using a plasma-sheath equation, where negative ions produced on the plasma grid (PG) surface are considered in addition to positive ions and electrons. The potential profile depends on the amount and the temperature of the surface produced negative ions and the profile of the magnetic field. The negative potential peak is formed in the sheath region near the PG surface for the case of strong surface production of negative ions or low temperature negative ions. As the increase rate of the magnetic field near the wall becomes large, the negative potential peak becomes small. 展开更多
关键词 negative ion source surface produced negative ion sheath potential cusp magnetic field electric potential plasma-sheath equation extraction region
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负离子对等离子体鞘层特性影响的数值研究(英文) 被引量:4
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作者 宫野 段萍 +3 位作者 张建红 邹秀 刘金远 刘悦 《计算物理》 EI CSCD 北大核心 2010年第6期883-890,共8页
构造强电负性等离子体中平板电极处鞘层形成的模型,使用流体动力学方程组研究等离子体鞘层.得到空间电势、空间静电荷分布和鞘层宽度作为距离函数的数值结果.结果表明,强电负性鞘层中,在等离子体区和鞘层区之间几乎没有过渡的预鞘区,在... 构造强电负性等离子体中平板电极处鞘层形成的模型,使用流体动力学方程组研究等离子体鞘层.得到空间电势、空间静电荷分布和鞘层宽度作为距离函数的数值结果.结果表明,强电负性鞘层中,在等离子体区和鞘层区之间几乎没有过渡的预鞘区,在靠近极板附近鞘层里的电子、负离子和正离子的分布形成一个纯正离子鞘区.在靠近鞘边附近,空间静电荷密度分布有一个很尖的峰.发现同电正性情形相比,强电负性鞘层的宽度要窄很多,空间电势下降得快得多. 展开更多
关键词 负离子 等离子体鞘层 空间电势 空间静电荷分布 数值模拟
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Numerical Simulation of Ion Extraction Through Ion Thruster Optics 被引量:1
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作者 钟凌伟 刘宇 +1 位作者 温正 任军学 《Plasma Science and Technology》 SCIE EI CAS CSCD 2010年第1期103-108,共6页
Based on the particle-in-cell (PIC) method, a two-dimensional numerical scheme was developed to investigate the ion beam extraction phenomena through the ion thruster optics. According to the calculated results, the... Based on the particle-in-cell (PIC) method, a two-dimensional numerical scheme was developed to investigate the ion beam extraction phenomena through the ion thruster optics. According to the calculated results, the plasma sheath upstream of the screen grid, the electric field in the calculation domain, and the ion and electron spatial distributions are obtained for different accelerator grid voltages. The results indicate that the accelerator grid voltage affects the plasma sheath upstream of the screen grid significantly. It is found that a moderate accelerator grid voltage results in an ion optical performance better than either a higher or lower voltage, from a point of ion extraction from the discharge chamber and erosion mitigation of the accelerator grid due to the direct ion impingement. 展开更多
关键词 electric propulsion ion thruster ion optics particle simulation plasma sheath
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基于一维电子平衡流体模型的平行板离子引出数值模拟 被引量:3
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作者 陈坚 向金秋 +6 位作者 郭恒 李和平 陈兴 王鹏 柴俊杰 姜东君 周明胜 《高电压技术》 EI CAS CSCD 北大核心 2017年第6期1830-1836,共7页
离子引出是一个涉及多粒子相互作用、多物理场耦合的复杂物理过程,研究引出过程中不同参数对于引出特性的影响,对于优化离子引出过程的工艺参数具有一定的指导意义。为此基于描述非平衡等离子体输运特性的物理数学模型,推导了描述金属... 离子引出是一个涉及多粒子相互作用、多物理场耦合的复杂物理过程,研究引出过程中不同参数对于引出特性的影响,对于优化离子引出过程的工艺参数具有一定的指导意义。为此基于描述非平衡等离子体输运特性的物理数学模型,推导了描述金属等离子体引出过程中各组分运动规律的一维电子平衡流体模型,并通过与解析解和实验测量结果的对比验证了所发展的物理数学模型和计算机程序代码的正确性。在此基础上,系统研究了不同工况下等离子体鞘层的时空演化特性以及离子引出时间和引出效率。结果表明:等离子体初始密度较高时,引出过程中存在显著的屏蔽效应;引出电压、电子温度的升高或极板间距的减小都将缩短引出时间;考虑共振电荷转移过程得到的离子引出时间与无碰撞条件下的离子引出时间相差不大,但共振电荷转移会导致目标离子损失。 展开更多
关键词 离子引出 电子平衡流体模型 共振电荷转移 平行板 鞘层
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Ions Bombardment in Thin Films and Surface Processing
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作者 许沭华 任兆杏 《Plasma Science and Technology》 SCIE EI CAS CSCD 2003年第3期1841-1848,共8页
Ions bombardment is very important in thin films and surface processing. The ion energy and ion flux are two important parameters in ion bombardment. The ion current density mainly dependent on the plasma density give... Ions bombardment is very important in thin films and surface processing. The ion energy and ion flux are two important parameters in ion bombardment. The ion current density mainly dependent on the plasma density gives the number of energetic ions bombarding the substrate. The self-bias voltage in plasma sheath accelerates plasma ions towards the substrate. RF discharge can increase plasma density and RF bias can also provide the insulator substrate with a plasma sheath. In order to choose and control ion energy, ion density, the angle of incidence, and ion species, ion beam sources are used. New types of electrodeless ion sources (RF, MW, ECR-MW) have been introduced in detail. In the last, the effects of ion bombardment on thin films and surface processing are presented. 展开更多
关键词 low temperature plasma ion bombardment plasma sheath RF bias ion beam source
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Two-dimensional particle-in-cell plasma source ion implantation of a prolate spheroid target
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作者 刘成森 韩宏颖 +2 位作者 彭晓晴 昶叶 王德真 《Chinese Physics B》 SCIE EI CAS CSCD 2010年第3期363-366,共4页
A two-dimensional particle-in-cell simulation is used to study the time-dependent evolution of the sheath surrounding a prolate spheroid target during a high voltage pulse in plasma source ion implantation. Our study ... A two-dimensional particle-in-cell simulation is used to study the time-dependent evolution of the sheath surrounding a prolate spheroid target during a high voltage pulse in plasma source ion implantation. Our study shows that the potential contour lines pack more closely in the plasma sheath near the vertex of the major axis, i.e. where a thinner sheath is formed, and a non-uniform total ion dose distribution is incident along the surface of the prolate spheroid target due to the focusing of ions by the potential structure. Ion focusing takes place not only at the vertex of the major axis, where dense potential contour lines exist, but also at the vertex of the minor axis, where sparse contour lines exist. This results in two peaks of the received ion dose, locating at the vertices of the major and minor axes of the prolate spheroid target, and an ion dose valley, staying always between the vertices, rather than at the vertex of the minor axis. 展开更多
关键词 plasma source ion implantation ion sheath two-dimensional particle-in-cell model iondose
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Simulations of Ion Behaviors in a Photoresist Trench During Plasma Etching Driven by a Radio-Frequency Source 被引量:1
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作者 戴忠玲 岳光 王友年 《Plasma Science and Technology》 SCIE EI CAS CSCD 2012年第3期240-244,共5页
Ion's behavior plays an important role in plasma etching processes and is determined by the local electric potential in the etched trenches. In this study, with the trench powered by a radio frequency (rf) source, ... Ion's behavior plays an important role in plasma etching processes and is determined by the local electric potential in the etched trenches. In this study, with the trench powered by a radio frequency (rf) source, the Laplace equation is solved to obtain the electric potential. The ion trajectories and the ion energy distribution (IED) at the bottom of the trench are obtained self-consistently by tracking the ions in the trench. The results show that the aspect ratio of depth- to-width of the photoresist trench and the voltage amplitude of the rf source applied to the electrode are important parameters. The larger the aspect ratio and the smaller the amplitude are, the more ions hit the sidewalls, which results in a notching phenomenon. Meanwhile, there are a higher high-energy peak and a lower low-energy peak in the IED with the increase in aspect ratio. 展开更多
关键词 ion behavior plasma sheath Monte-Carlo rf photoresist trench
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The Electrostatic Cylindrical Sheath in a Plasma
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作者 王春华 孙晓霞 白冬雪 《Plasma Science and Technology》 SCIE EI CAS CSCD 2004年第2期2247-2249,共3页
The electrostatic sheath with a cylindrical geometry in an ion-electron plasma is investigated. Assuming a Boltzmann response to electrons and cold ions with bulk flow, it is shown that the radius of the cylindrical ... The electrostatic sheath with a cylindrical geometry in an ion-electron plasma is investigated. Assuming a Boltzmann response to electrons and cold ions with bulk flow, it is shown that the radius of the cylindrical geometry do not affect the sheath potential significantly. We also found that the sheath potential profile is steeper in the cylindrical sheath compared to the slab sheath. The distinct feature of the cylindrical sheath is that the ion density distribution is not monotonous. The sheath region can be divided into three regions, two ascendant regions and one descendant region. 展开更多
关键词 plasma sheath ion-electron plasma
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Modelling of electronegative collisional warm plasma for plasma-surface interaction process 被引量:1
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作者 Rajat DHAWAN Hitendra K MALIK 《Plasma Science and Technology》 SCIE EI CAS CSCD 2021年第4期48-54,共7页
An electronegative collisional plasma having warm and massive positive ions,non-extensive distributed electrons and Boltzmann distributed negative ions is modelled for the plasma-surface interaction process that is us... An electronegative collisional plasma having warm and massive positive ions,non-extensive distributed electrons and Boltzmann distributed negative ions is modelled for the plasma-surface interaction process that is used for the surface nitriding.Specifically the sheath formation is evaluated through the Bohm’s criterion,which is found to be modified,and the variation of the sheath thickness and profiles of the density of plasma species and the net space charge density in the sheath region in addition to the electric potential.The effect of ion temperature,nonextensivity and collisional parameter is examined in greater detail considering the collisional cross-section to obey power-law dependency on the positive ion velocity.The positive ions are found to enter in the sheath region at lower velocities in the collisional plasma compared to the case of collision-less plasma;this velocity sees minuscule reduction with increasing nonextensivity.The increasing ion temperature and collisional parameter lead to the formation of sheath with smaller thickness. 展开更多
关键词 electronegative sheath ion temperature non-extensivity sheath thickness power-law dependency COLLISionS
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Ion Transport to a Photoresist Trench in a Radio Frequency Sheath
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作者 张赛谦 戴忠玲 王友年 《Plasma Science and Technology》 SCIE EI CAS CSCD 2012年第11期958-964,共7页
We present a model which is used to study ion transport in capacitively coupled plasma (CCP) discharge driven by a radio-frequency (rf) source for an etching process. The model combines a collisional sheath model ... We present a model which is used to study ion transport in capacitively coupled plasma (CCP) discharge driven by a radio-frequency (rf) source for an etching process. The model combines a collisional sheath model with a trench model. The sheath model can calculate the ion energy distributions (IEDs) and ion angular distributions (IADs) to specify the initial conditions of the ions incident into the trench domain (a simulation area near and in the trench). Then, considering the charging effect on the photoresist sidewalls and the rf-bias applied to the substrate, the electric potentials in the trench domain are computed by solving the Laplace equation. Finally, the trajectories, IEDs and IADs of ions impacting on the bottom of the trench are obtained using the trench model. Numerical results show that as the pressure increases, ions tend to strike the trench bottom with smaller impact energies and larger incident angles due to the collision processes, and the existence of the trench has distinct influences on the shape of the IEDs and IADs. In addition, as the bias amplitude increases, heights of both peaks decrease and the IEDs spread to a higher energy region. 展开更多
关键词 ion motion IED IAD charging effect sheath plasma etching CCP
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Effects of Magnetic Field and Ion Velocity on SPT Plasma Sheath Characteristics
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作者 段萍 周新维 +4 位作者 刘媛 曹安宁 覃海娟 陈龙 殷燕 《Plasma Science and Technology》 SCIE EI CAS CSCD 2014年第2期161-167,共7页
The distribution of magnetic field in Hall thruster channel has significant effect on its discharge process and wall plasma sheath characteristics. By creating physical models for the wall sheath region and adopting t... The distribution of magnetic field in Hall thruster channel has significant effect on its discharge process and wall plasma sheath characteristics. By creating physical models for the wall sheath region and adopting two-dimensional particle in cell simulation method, this work aims to investigate the effects of magnitude and direction of magnetic field and ion velocity on the plasma sheath characteristics. The simulation results show that magnetic field magnitudes have small impact on the sheath potential and the secondary electron emission coefficient, magnetic azimuth between the magnetic field direction and the channel radial direction is proportional to the absolute value of the sheath potential, but inversely proportional to the secondary electron emission coefficient. With the increase of the ion incident velocity, secondary electron emission coefficient is enhanced, however, electron density number, sheath potential and radial electric field are decreased. When the boundary condition is determined, with an increase of the sinmlation area radial scale, the sheath potential oscillation is aggravated, and the stability of the sheath is reduced. 展开更多
关键词 magnetic field ion velocity sheath potential secondary electron emission
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用集团运动的观点来研究回流离子问题
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作者 龙继东 林郁正 +1 位作者 石金水 禹海军 《高能物理与核物理》 CSCD 北大核心 2005年第12期1185-1189,共5页
建立在单粒子运动学基础上的回流离子理论预测:强流电子束轰击在辐射转换靶上可能产生正离子.这些离子在电子柬空间电荷场作用下回流,会造成电子束过聚焦,改变焦斑大小,从而影响X光机的照相分辨率.然而大量的实验没有发现相关的现象,本... 建立在单粒子运动学基础上的回流离子理论预测:强流电子束轰击在辐射转换靶上可能产生正离子.这些离子在电子柬空间电荷场作用下回流,会造成电子束过聚焦,改变焦斑大小,从而影响X光机的照相分辨率.然而大量的实验没有发现相关的现象,本文分析认为,电子束打靶时,在靶表面可能会形成离子鞘层过渡区.该区域可以抵消束流空间电荷场对回流离子的驱动作用,因此,回流离子可能以等离子体集团扩散的方式运动.这种物理图像得到的结论是离子对聚焦的影响可忽略,和已有的实验结果相吻合. 展开更多
关键词 束靶相互作用 回流离子 离子鞘层 电子束聚焦
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