以甲基氢二氯硅烷(Me HSi Cl2)为单体,六甲基二硅氧烷(MM)为封端剂,浓硫酸为催化剂,甲苯为溶剂,通过催化平衡制得高含氢硅油。通过红外光谱对产品结构进行表征。研究了水的滴加速度、催化剂用量、催化平衡时间、反应温度以及封端剂MM用...以甲基氢二氯硅烷(Me HSi Cl2)为单体,六甲基二硅氧烷(MM)为封端剂,浓硫酸为催化剂,甲苯为溶剂,通过催化平衡制得高含氢硅油。通过红外光谱对产品结构进行表征。研究了水的滴加速度、催化剂用量、催化平衡时间、反应温度以及封端剂MM用量对产物性能的影响。最佳工艺条件为:水的滴加速度0.3 m L/min,催化剂浓硫酸用量2.5 m L,催化平衡时间24 h,反应温度20℃,Me HSi Cl2用量50 m L、封端剂MM用量1.2 m L。展开更多
The deposition of organosilicone thin films from hexamethyldisiloxane（HMDSO） by using a dual-frequency （50 kHz/33 MHz） atmospheric-pressure micro-plasma jet with an admixture of a small volume of HMDSO and Ar was ...The deposition of organosilicone thin films from hexamethyldisiloxane（HMDSO） by using a dual-frequency （50 kHz/33 MHz） atmospheric-pressure micro-plasma jet with an admixture of a small volume of HMDSO and Ar was investigated.The topography was measured by using scanning electron microscopy.The chemical bond and composition of these films were analyzed by Fourier transform infrared spectroscopy （FTIR） and x-ray photoelectron spectroscopy.The results indicated that the as-deposited film was constituted by silicon,carbon,and oxygen elements,and FTIR suggested the films are organosilicon with the organic component （-CHx） and hydroxyl functional group（-OH） connected to the Si-O-Si backbone.Thin-film hardness was recorded by an MH-5-VM Digital Micro-Hardness Tester.Radio frequency power had a strong impact on film hardness and the hardness increased with increasing power.展开更多
One of the most widely used and well-established atomic oxygen(AO)protection solutions for low Earth orbit(LEO)satellites is the deposition of protective coatings on polymeric materials.However,manufacturing extensive...One of the most widely used and well-established atomic oxygen(AO)protection solutions for low Earth orbit(LEO)satellites is the deposition of protective coatings on polymeric materials.However,manufacturing extensive expanses of these coating materials with good transparency,flexibility,smoothness,ultra-thinness,and exceptional AO resistance remains a critical issue.Herein,we successfully deposited a 400 nm thick polyorgansiloxane(SiO_(x)C_(y)H_(z))coating with high optical transparency and uniform good adherence on to a 1.2 m wide polyimide surface,by optimizing the distribution of hexamethyldisiloxane and oxygen as precursors in the roll-to-roll compatible plasmaenhanced chemical vapor deposition process.After AO irradiation with the fluence of 7.9×10^(20)atoms·cm^(–2),the erosion yield of the SiO_(x)C_(y)H_(z)-coated Kapton was less than 2.30×10^(–26)cm^3·atom^(–1),which was less than 0.77%of that of the Kapton.It indicates that the SiO_(x)C_(y)H_(z)coating can well prevent the erosion of Kapton by AO.In addition,it was also clarified that a SiO_(2) passivation layer was formed on the surface of the SiO_(x)C_(y)H_(z)coating during AO irradiation,which exhibited a‘self-reinforcing’defense mechanism.The entire preparation process of the SiO_(x)C_(y)H_(z)coating was highly efficient and low-cost,and it has shown great potential for applications in LEO.展开更多
文摘以甲基氢二氯硅烷(Me HSi Cl2)为单体,六甲基二硅氧烷(MM)为封端剂,浓硫酸为催化剂,甲苯为溶剂,通过催化平衡制得高含氢硅油。通过红外光谱对产品结构进行表征。研究了水的滴加速度、催化剂用量、催化平衡时间、反应温度以及封端剂MM用量对产物性能的影响。最佳工艺条件为:水的滴加速度0.3 m L/min,催化剂浓硫酸用量2.5 m L,催化平衡时间24 h,反应温度20℃,Me HSi Cl2用量50 m L、封端剂MM用量1.2 m L。
基金supported by National Natural Science Foundation of China(Grant No.11165012,Grant No. 11665012)the Project of the Natural Science Foundation of GanSu(145RJZA159)
文摘The deposition of organosilicone thin films from hexamethyldisiloxane（HMDSO） by using a dual-frequency （50 kHz/33 MHz） atmospheric-pressure micro-plasma jet with an admixture of a small volume of HMDSO and Ar was investigated.The topography was measured by using scanning electron microscopy.The chemical bond and composition of these films were analyzed by Fourier transform infrared spectroscopy （FTIR） and x-ray photoelectron spectroscopy.The results indicated that the as-deposited film was constituted by silicon,carbon,and oxygen elements,and FTIR suggested the films are organosilicon with the organic component （-CHx） and hydroxyl functional group（-OH） connected to the Si-O-Si backbone.Thin-film hardness was recorded by an MH-5-VM Digital Micro-Hardness Tester.Radio frequency power had a strong impact on film hardness and the hardness increased with increasing power.
基金financially supported by National Natural Science Foundation of China (No.U1937601)the Industrial Technology Development Program of China(No.JCKY 2020203B019).
文摘One of the most widely used and well-established atomic oxygen(AO)protection solutions for low Earth orbit(LEO)satellites is the deposition of protective coatings on polymeric materials.However,manufacturing extensive expanses of these coating materials with good transparency,flexibility,smoothness,ultra-thinness,and exceptional AO resistance remains a critical issue.Herein,we successfully deposited a 400 nm thick polyorgansiloxane(SiO_(x)C_(y)H_(z))coating with high optical transparency and uniform good adherence on to a 1.2 m wide polyimide surface,by optimizing the distribution of hexamethyldisiloxane and oxygen as precursors in the roll-to-roll compatible plasmaenhanced chemical vapor deposition process.After AO irradiation with the fluence of 7.9×10^(20)atoms·cm^(–2),the erosion yield of the SiO_(x)C_(y)H_(z)-coated Kapton was less than 2.30×10^(–26)cm^3·atom^(–1),which was less than 0.77%of that of the Kapton.It indicates that the SiO_(x)C_(y)H_(z)coating can well prevent the erosion of Kapton by AO.In addition,it was also clarified that a SiO_(2) passivation layer was formed on the surface of the SiO_(x)C_(y)H_(z)coating during AO irradiation,which exhibited a‘self-reinforcing’defense mechanism.The entire preparation process of the SiO_(x)C_(y)H_(z)coating was highly efficient and low-cost,and it has shown great potential for applications in LEO.
