The microwave absorption dielectric-spectrum technique was used to study the decay kinetics of photoelectrons in sulfur-sensitized silver halide crystals. The time-resolution spectrum of free electrons and shallow-tra...The microwave absorption dielectric-spectrum technique was used to study the decay kinetics of photoelectrons in sulfur-sensitized silver halide crystals. The time-resolution spectrum of free electrons and shallow-trapped electrons generated in sulfur-sensitized AgBrl crystals has been obtained. The relationship of the trapping effect of sensitization centers Ag2S and sensitization time or temperature in emulsions has been duscussed. With the increase in the sensitization time and temperature, the trap effect of sulfur sensitization centers varies from hole trap to shallow electron trap, and deep electron trap.展开更多
为了研究不同纳米添加物对聚酰亚胺(polyimide,PI)电气性能的影响,采用原位聚合法制备了纯PI薄膜、PI质量分数10%的PI/SiO_2和PI/Al_2O_3纳米复合薄膜,测试其电导率(表面、体积电导率)、介电频谱、方波脉冲下的局部放电以及耐电晕性能,...为了研究不同纳米添加物对聚酰亚胺(polyimide,PI)电气性能的影响,采用原位聚合法制备了纯PI薄膜、PI质量分数10%的PI/SiO_2和PI/Al_2O_3纳米复合薄膜,测试其电导率(表面、体积电导率)、介电频谱、方波脉冲下的局部放电以及耐电晕性能,并用SEM观察击穿点周围的表面形貌。结果表明:PI/SiO_2膜的电导率大于PI/Al_2O_3膜,其中表面电导率是PI/Al_2O_3膜的6倍;PI/Al_2O_3膜、PI/SiO_2膜、PI膜的介电常数依次降低;PI/SiO_2膜和纯PI膜的介电损耗角正切值(tanδ)随频率的增加先减小后增大,PI/Al_2O_3膜的tanδ值在6 k Hz后最大;由于空间电荷弛豫,PI/Al_2O_3膜的tanδ值在0.02Hz左右出现了一个峰值;另外,因为电荷扩散能力不同,PI/SiO_2膜、PI/Al_2O_3膜以及PI膜的局部放电起始电压和耐电晕时间依次减小,而局部放电的平均幅值则依次增大;电晕放电使得3种薄膜表面都形成了很多微孔、裂纹,纳米复合薄膜表面出现块状物。研究结果表明:复合薄膜中界面体积分数和纳米粒子极性,是造成PI/SiO_2薄膜和PI/Al_2O_3薄膜电气性能差异的主要原因。展开更多
基金This work was supported by the National Natural Science Foundation of China(Grant Nos.10354001,10274017)the Key Science and Technology Project of Ministry of Education of China(Grant No.01011)the Doctor Foundation of Hebei Province of China(Grant No.01547012D).
文摘The microwave absorption dielectric-spectrum technique was used to study the decay kinetics of photoelectrons in sulfur-sensitized silver halide crystals. The time-resolution spectrum of free electrons and shallow-trapped electrons generated in sulfur-sensitized AgBrl crystals has been obtained. The relationship of the trapping effect of sensitization centers Ag2S and sensitization time or temperature in emulsions has been duscussed. With the increase in the sensitization time and temperature, the trap effect of sulfur sensitization centers varies from hole trap to shallow electron trap, and deep electron trap.
文摘为了研究不同纳米添加物对聚酰亚胺(polyimide,PI)电气性能的影响,采用原位聚合法制备了纯PI薄膜、PI质量分数10%的PI/SiO_2和PI/Al_2O_3纳米复合薄膜,测试其电导率(表面、体积电导率)、介电频谱、方波脉冲下的局部放电以及耐电晕性能,并用SEM观察击穿点周围的表面形貌。结果表明:PI/SiO_2膜的电导率大于PI/Al_2O_3膜,其中表面电导率是PI/Al_2O_3膜的6倍;PI/Al_2O_3膜、PI/SiO_2膜、PI膜的介电常数依次降低;PI/SiO_2膜和纯PI膜的介电损耗角正切值(tanδ)随频率的增加先减小后增大,PI/Al_2O_3膜的tanδ值在6 k Hz后最大;由于空间电荷弛豫,PI/Al_2O_3膜的tanδ值在0.02Hz左右出现了一个峰值;另外,因为电荷扩散能力不同,PI/SiO_2膜、PI/Al_2O_3膜以及PI膜的局部放电起始电压和耐电晕时间依次减小,而局部放电的平均幅值则依次增大;电晕放电使得3种薄膜表面都形成了很多微孔、裂纹,纳米复合薄膜表面出现块状物。研究结果表明:复合薄膜中界面体积分数和纳米粒子极性,是造成PI/SiO_2薄膜和PI/Al_2O_3薄膜电气性能差异的主要原因。
