The Cu25 Nb75 and Ni45Nb55 amorphous films with about 500nm thickness were prepared by ion beam assisted deposition (IBAD). Potentiodynamic polarization measurement was adopted to investigate the corrosion resistance ...The Cu25 Nb75 and Ni45Nb55 amorphous films with about 500nm thickness were prepared by ion beam assisted deposition (IBAD). Potentiodynamic polarization measurement was adopted to investigate the corrosion resistance of samples and the tests were carried out respectively in 1mol/L H2SO4 and NaOH aquatic solution. The corrosion performance of the amorphous films was compared with that of multilayered and pure Nb films. Experimental results indicated that the corrosion resistance of amorphous films was better than that of the corresponding multilayers and pure Nb films for both Ni-Nb system with negative heat of formation and Cu-Nb system with positive heat of formation.展开更多
目的以AlCl_3和LiAlH_4为溶质,苯和四氢呋喃为溶剂,进行电沉积铝镁合金,探索制备铝镁合金的最佳工艺条件。方法在AlCl_3-LiAlH_4-苯-四氢呋喃体系中,采用镁作阳极,通过预电沉积获得一定浓度的Mg^(2+),从而进行电沉积制备铝镁合金镀层。...目的以AlCl_3和LiAlH_4为溶质,苯和四氢呋喃为溶剂,进行电沉积铝镁合金,探索制备铝镁合金的最佳工艺条件。方法在AlCl_3-LiAlH_4-苯-四氢呋喃体系中,采用镁作阳极,通过预电沉积获得一定浓度的Mg^(2+),从而进行电沉积制备铝镁合金镀层。改变电流密度、沉积时间、预电沉积时间和预电沉积次数等参数,以探究工艺参数对铝镁镀层的形貌、晶粒大小和镁含量的影响,并通过SEM和EDS检测和分析铝镁合金的镀层形貌、成分及含量。结果镀层主要成分为Al_3Mg_2和Al_(12)Mg_(17),当电流密度为16.67 m A/cm^2时,获得的镀层表面效果最好,其晶粒尺寸可达1~2mm。预电沉积次数越多,通过预电沉积获得的Mg^(2+)越多,铝镁合金镀层中镁的含量越高,最高可达2.93%(质量分数)。结论在一定范围内,镀层中的镁含量随预电沉积时间的增加而提高。预电沉积次数越多,通过预电沉积溶解的Mg^(2+)越多,铝镁合金镀层中的镁含量越高。当沉积时间过长时,不利于镀层中镁含量的提高。铝镁镀层中的镁含量越高,电化学阻抗越大,腐蚀电位越大,镀层的耐腐蚀性能越好。展开更多
基金This work was supported in part by National Naturul Science Foundation of China(No.19875027)the Ministry of Science and Technology of China(No.G20000672071)by the Administration of Tsinghua University.
文摘The Cu25 Nb75 and Ni45Nb55 amorphous films with about 500nm thickness were prepared by ion beam assisted deposition (IBAD). Potentiodynamic polarization measurement was adopted to investigate the corrosion resistance of samples and the tests were carried out respectively in 1mol/L H2SO4 and NaOH aquatic solution. The corrosion performance of the amorphous films was compared with that of multilayered and pure Nb films. Experimental results indicated that the corrosion resistance of amorphous films was better than that of the corresponding multilayers and pure Nb films for both Ni-Nb system with negative heat of formation and Cu-Nb system with positive heat of formation.
文摘目的以AlCl_3和LiAlH_4为溶质,苯和四氢呋喃为溶剂,进行电沉积铝镁合金,探索制备铝镁合金的最佳工艺条件。方法在AlCl_3-LiAlH_4-苯-四氢呋喃体系中,采用镁作阳极,通过预电沉积获得一定浓度的Mg^(2+),从而进行电沉积制备铝镁合金镀层。改变电流密度、沉积时间、预电沉积时间和预电沉积次数等参数,以探究工艺参数对铝镁镀层的形貌、晶粒大小和镁含量的影响,并通过SEM和EDS检测和分析铝镁合金的镀层形貌、成分及含量。结果镀层主要成分为Al_3Mg_2和Al_(12)Mg_(17),当电流密度为16.67 m A/cm^2时,获得的镀层表面效果最好,其晶粒尺寸可达1~2mm。预电沉积次数越多,通过预电沉积获得的Mg^(2+)越多,铝镁合金镀层中镁的含量越高,最高可达2.93%(质量分数)。结论在一定范围内,镀层中的镁含量随预电沉积时间的增加而提高。预电沉积次数越多,通过预电沉积溶解的Mg^(2+)越多,铝镁合金镀层中的镁含量越高。当沉积时间过长时,不利于镀层中镁含量的提高。铝镁镀层中的镁含量越高,电化学阻抗越大,腐蚀电位越大,镀层的耐腐蚀性能越好。
